Influence of Ar Metastable on the Discharge Structure in Ar and N_2 Mixture in RF Discharges at 13.56 MHz (<Special Issue> Plasma Processing)

スポンサーリンク

概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-07-30

著者

• Nakano Nobuhiko

  Department Of Electrical Engineering Faculty Of Science And Technology Keio University

• Nakano Nobuhiko

  Department Of Electrical Engineering Keio University

• Tochikubo Fumiyoshi

  Department Of Electrical Engineering Tokyo Metropolitan University

• Tochikubo Fumiyoshi

  Departmen Of Electrical Engineering Tokyo Metropolitan University

• PETROVIC Zoran

  Institute of Physics, University of Belgrade

• KAKUTA Shigeru

  Department of Electrical Engineering, Keio University

• MAKABE Toshiaki

  Department of Electrical Engineering, Keio University

• Makabe Toshiaki

  Department Of Electrical Engineering Faculty Of Science And Technology Keio University

• Makabe Toshiaki

  Department Of Electrical Engineering Keio University

• Petrovic Zoran

  Institute Of Physics University Of Belgrade

• Petrovic Zoran

  Institute Of Physics

• Kakuta S

  Department Of Electrical Engineering Keio University

• Kakuta Shigeru

  Department Of Electrical Engineering Faculty Of Science And Technology Keio University

• Tochikubo F

  Tokyo Metropolitan Univ. Tokyo Jpn

関連論文

• Influence of Ar Metastable on the Discharge Structure in Ar and N_2 Mixture in RF Discharges at 13.56 MHz ( Plasma Processing)
• Two-Dimensional Modeling of Spatiotemporal Structure of Inductively Coupled Plasma
• Dependence of Driving Frequency on Capacitively Coupled Plasma in CF_4
• A Study of the Sustaining Mechanism in an Inductively Coupled Plasma ( Plasma Processing)
• Drift Velocities of Electrons in Time Varying Electric Fields
• Two-Dimensional Transport of Submicron Particles in Capacitively Coupled Plasma Reactor
• Phase Transitions in DC Discharges in SiH_4
• Optical Emission Spectroscopy of Pulsed Inductively Coupled Plasma in Ar : Nuclear Science, Plasmas, and Electric Discharges
• Two-Dimensional Self-Consistent Simulation of a DC Magnetron Discharge
• Experimental Study of Very-High-Frequency Plasmas in H_2 by Spatiotemporally Resolved Optical Emission Spectroscopy ( Plasma Processing)
• Rare Gas Metastable Atom Density in Diluted O_2 RF Plasmas
• A Numerical Study of a Collision-Dominated Inductively Coupled Plasma Using Particle-in-Cell/Monte Carlo Simulation
• Effect of Surface Material on Spatiotemporal Structure in O_2 RF Glow Discharge
• Volt Ampere Characteristics of Low Current DC Discharges in Ar, H_2, CH_4 and SF_6
• Application of Image Reconstruction Technique for the Measurement of Two-Dimensional Ion Energy Distributions Using a Retarding-Field Energy Analyzer
• Transport Parameters for Electrons in Carbon Monoxide
• The Radical Transport in the Narrow-Gap-Reactive-Ion Etcher in SF_6 by the Relaxation Continuum Model
• Initial Growth Process of Barrier Discharge in Atmospheric Pressure Helium for Glow Discharge Formation
• Boltzmann Equation Analysis of Electron Transport in a N2--O2 Streamer Discharge
• Theoretical Analysis of Electron Velocity Distribution Functions and Transport Coefficients in HCl in a DC Electric Field
• Influence of Impurities on Surface Recombination of Nitrogen Atoms in Late Afterglow
• Structure of Low-Frequency Helium Glow Discharge at Atmospheric Pressure between Parallel Plate Dielectric Electrodes
• Numerical Simulation of Streamer Propagation and Radical Reactions in Positive Corona Discharge in N_2/NO and N_2/O_2/NO
• Improvement of NO_x Removal Efficiency Assisted by Aqueous-Phase Reaction in Corona Discharge
• A Novel Sustaining Mechanism in Capacitively Coupled Radio Frequency Plasma in Oxygen
• A novel sustaining mechanism in capacitively coupled radiofrequency plasma
• Numerical Study of the Effects of Frequency in Inductively Coupled Plasma Using Particle-in-Cell/Monte Carlo Simulation
• Simulation of Atmospheric Pressure Direct Current Glow Discharge along a Miniature Helium Flow in Nitrogen
• Effects of Plasma Molding on Feature Profile of Silicon Micro-Electro-Mechanical Systems through Flux Ion Velocity Distributions in Two-Frequency Capacitively Coupled Plasma in SF6/O2
• Influence of the Finite Mass-Ratio on the Charged-Particle Transport in Gases
• Numerical Simulation of High-Frequency Driven Dielectric Barrier Microdischarge with Coplanar Electrode Configuration in Ar
• Time-Dependent RF Swarm Transport by Direct Numerical Procedure of the Boltzmann Equation ( Plasma Processing)
• Measurement of Amount of Pattern Trim and Surface Chemistry for Organic Resist Etching in an Inductively Coupled Plasma in SO2–O2 Gas Mixtures
• Evaluation of Errors in Feedback Control Based on Persistence Prediction in Model-Based Process Controller System for Deep Sub-100 nm Gate Fabrication
• Self-Consistent Modeling of Feature Profile Evolution in Plasma Etching and Deposition
• Influence of Penning Ionization on Glowlike Dielectric Barrier Discharge Formation in Medium-Pressure Ar
• Modeling of Feature Profile Evolution in SiO2 as functions of Radial Position and Bias Voltage under Competition among Charging, Deposition, and Etching in Two-Frequency Capacitively Coupled Plasma
• Numerical Simulation of NO Oxidation in Dielectric Barrier Discharge with Microdischarge Formation
• Study of Wastewater Treatment by OH Radicals Using DC and Pulsed Corona Discharge over Water
• Study on Decay Characteristics of OH Radical Density in Pulsed Discharge in Ar/H2O
• Transport Coefficients for Electrons in Mixtures of Ar and HBr
• Two-Dimensional Transport of Submicron Particles in Capacitively Coupled Plasma Reactor
• A Numerical Study of a Collision-Dominated Inductively Coupled Plasma Using Particle-in-Cell/Monte Carlo Simulation
• Volt Ampere Characteristics of Low Current DC Discharges in Ar, H 2, CH 4 and SF 6

もっと見る 閉じる

スポンサーリンク