Numerical Simulation of NO Oxidation in Dielectric Barrier Discharge with Microdischarge Formation
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概要
- 論文の詳細を見る
In this work, we developed a simulation model for plasma-enhanced chemical reaction in dielectric barrier discharge (DBD) in consideration of filamentary microdischarge formation. The first stage is the calculation of single filamentary microdischarge developed in DBD with parallel plate geometry using the fluid model. The second stage is the calculation of chemical processes with a set of rate equations using the radical production yield obtained in the filamentary microdischarge calculation. This model was applied to the NO oxidation process, which is often important in NOx removal using gas discharges, in atmospheric pressure N2/O2/NO mixtures under various discharge conditions. The calculated NO oxidation property has a quantitatively good agreement with the experimental one under wide discharge conditions. Therefore, the method used in this work is valid for the prediction of chemical processes in DBD. We also discuss the effect of gas temperature and gas residence time on NO oxidation.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2009-07-25
著者
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Tochikubo Fumiyoshi
Departmen Of Electrical Engineering Tokyo Metropolitan University
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Yasui Hiroyuki
Toshiba Corporation, 2-4, Suehiro-cho, Tsurumi-ku, Yokohama 230-0045, Japan
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UCHIDA Satoshi
Department of Chemistry and Materials Engineering, Faculty of Chemistry, Materials and Bioengineering, Kansai University
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Sato Kazuo
Toshiba Corporation, Toshiba-cho, Fuchu, Tokyo 183-8511, Japan
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