Self-Consistent Modeling of Feature Profile Evolution in Plasma Etching and Deposition
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2006-02-25
著者
-
Makabe Toshiaki
Department Of Electrical Engineering Faculty Of Science And Technology Keio University
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Yagisawa Takashi
Department Of Electronics And Electrical Engineering Keio University
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Shimada Takashi
Department Of Applied Physics School Of Engineering The University Of Tokyo
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