A Novel Sustaining Mechanism in Capacitively Coupled Radio Frequency Plasma in Oxygen

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概要

• 論文の詳細を見る

• This study presents numerical evidence regarding a new type of self-sustaining mechanism for capacitively-coupled-radiofrequency plasma utilizing a self-consistent relaxation continuum model. The regime's existence depends on an electron source, produced by a detachment reaction from negative ions with high density in the bulk plasma, under a system that the spatiotemporal total rate of electron attachment is greater than that of ionization. That is, a novel mechanism differs markedly from previous ones that radiofrequency plasmas are mainly sustained by the ionization multiplication of low density electrons in a sheath/plasma boundary. The consequences of this finding are discussed from both charge balance and reaction sequence balance in the bulk plasma at 13.56 MHz in oxygen.

• 社団法人応用物理学会の論文
• 1998-07-15

著者

• Shibata M

  Department Of Electrical Engineering Faculty Of Science And Technology Keio University

• Shibata Mari

  Department Of Dermatology Showa University School Of Medicine

• Nakano Nobuhiko

  Department Of Electrical Engineering Faculty Of Science And Technology Keio University

• Nakano Nobuhiko

  Faculty Of Science And Technology Department Of Electrical Engineering Keio University

• Makabe T

  Keio Univ. Yokohama Jpn

• Makabe Toshiaki

  Department Of Electrical Engineering Faculty Of Science And Technology Keio University

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