A Novel Sustaining Mechanism in Capacitively Coupled Radio Frequency Plasma in Oxygen
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概要
- 論文の詳細を見る
This study presents numerical evidence regarding a new type of self-sustaining mechanism for capacitively-coupled-radiofrequency plasma utilizing a self-consistent relaxation continuum model. The regime's existence depends on an electron source, produced by a detachment reaction from negative ions with high density in the bulk plasma, under a system that the spatiotemporal total rate of electron attachment is greater than that of ionization. That is, a novel mechanism differs markedly from previous ones that radiofrequency plasmas are mainly sustained by the ionization multiplication of low density electrons in a sheath/plasma boundary. The consequences of this finding are discussed from both charge balance and reaction sequence balance in the bulk plasma at 13.56 MHz in oxygen.
- 社団法人応用物理学会の論文
- 1998-07-15
著者
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Shibata M
Department Of Electrical Engineering Faculty Of Science And Technology Keio University
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Shibata Mari
Department Of Dermatology Showa University School Of Medicine
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Nakano Nobuhiko
Department Of Electrical Engineering Faculty Of Science And Technology Keio University
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Nakano Nobuhiko
Faculty Of Science And Technology Department Of Electrical Engineering Keio University
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Makabe T
Keio Univ. Yokohama Jpn
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Makabe Toshiaki
Department Of Electrical Engineering Faculty Of Science And Technology Keio University
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