Optical Emission Spectroscopy of Pulsed Inductively Coupled Plasma in Ar : Nuclear Science, Plasmas, and Electric Discharges
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-11-01
著者
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MAKABE Toshiaki
Department of Electrical Engineering, Keio University
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Makabe Toshiaki
Department Of Electronics And Electrical Engineering Keio University
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Makabe Toshiaki
Department Of Electrical Engineering Faculty Of Science And Technology Keio University
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Petrovic Zoran
Department Of Electronics And Electrical Engineering Keio University
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HIOKI Kazuya
Department of Electronics and Electrical Engineering, Keio University
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ITAZU Naoki
Department of Electronics and Electrical Engineering, Keio University
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Itazu Naoki
Department Of Electronics And Electrical Engineering Keio University
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Hioki Kazuya
Department Of Electronics And Electrical Engineering Keio University
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MAKABE Toshiaki
Department of Electronics and Electrical Engineering, Keio University
関連論文
- Influence of Ar Metastable on the Discharge Structure in Ar and N_2 Mixture in RF Discharges at 13.56 MHz ( Plasma Processing)
- Two-Dimensional Modeling of Spatiotemporal Structure of Inductively Coupled Plasma
- Dependence of Driving Frequency on Capacitively Coupled Plasma in CF_4
- A Study of the Sustaining Mechanism in an Inductively Coupled Plasma ( Plasma Processing)
- Two-Dimensional Transport of Submicron Particles in Capacitively Coupled Plasma Reactor
- Phase Transitions in DC Discharges in SiH_4
- Optical Emission Spectroscopy of Pulsed Inductively Coupled Plasma in Ar : Nuclear Science, Plasmas, and Electric Discharges
- Two-Dimensional Self-Consistent Simulation of a DC Magnetron Discharge
- Experimental Study of Very-High-Frequency Plasmas in H_2 by Spatiotemporally Resolved Optical Emission Spectroscopy ( Plasma Processing)
- Rare Gas Metastable Atom Density in Diluted O_2 RF Plasmas
- A Numerical Study of a Collision-Dominated Inductively Coupled Plasma Using Particle-in-Cell/Monte Carlo Simulation
- Effect of Surface Material on Spatiotemporal Structure in O_2 RF Glow Discharge
- The Radical Transport in the Narrow-Gap-Reactive-Ion Etcher in SF_6 by the Relaxation Continuum Model
- Theoretical Analysis of Electron Velocity Distribution Functions and Transport Coefficients in HCl in a DC Electric Field
- A Novel Sustaining Mechanism in Capacitively Coupled Radio Frequency Plasma in Oxygen
- A novel sustaining mechanism in capacitively coupled radiofrequency plasma
- Numerical Study of the Effects of Frequency in Inductively Coupled Plasma Using Particle-in-Cell/Monte Carlo Simulation
- Effects of Plasma Molding on Feature Profile of Silicon Micro-Electro-Mechanical Systems through Flux Ion Velocity Distributions in Two-Frequency Capacitively Coupled Plasma in SF6/O2
- Influence of the Finite Mass-Ratio on the Charged-Particle Transport in Gases
- Time-Dependent RF Swarm Transport by Direct Numerical Procedure of the Boltzmann Equation ( Plasma Processing)
- Measurement of Amount of Pattern Trim and Surface Chemistry for Organic Resist Etching in an Inductively Coupled Plasma in SO2–O2 Gas Mixtures
- Evaluation of Errors in Feedback Control Based on Persistence Prediction in Model-Based Process Controller System for Deep Sub-100 nm Gate Fabrication
- Self-Consistent Modeling of Feature Profile Evolution in Plasma Etching and Deposition
- Modeling of Feature Profile Evolution in SiO2 as functions of Radial Position and Bias Voltage under Competition among Charging, Deposition, and Etching in Two-Frequency Capacitively Coupled Plasma
- Transport Coefficients for Electrons in Mixtures of Ar and HBr
- Two-Dimensional Transport of Submicron Particles in Capacitively Coupled Plasma Reactor
- A Numerical Study of a Collision-Dominated Inductively Coupled Plasma Using Particle-in-Cell/Monte Carlo Simulation