Dependence of Driving Frequency on Capacitively Coupled Plasma in CF_4

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1999-07-30

著者

• Nakano Nobuhiko

  Department Of Electrical Engineering Faculty Of Science And Technology Keio University

• MAKABE Toshiaki

  Department of Electrical Engineering, Keio University

• Segawa Sumie

  Central Research Laboratory, Tokyo Electron Limited

• Kurihara Masaru

  Department of Electrical Engineering, Keio University

• Makabe Toshiaki

  Department Of Electrical Engineering Faculty Of Science And Technology Keio University

• Kurihara Masaru

  Department Of Electrical Engineering Keio University

• Segawa Sumie

  Central Research Laboratory Tokyo Electron Limited

関連論文

• Influence of Ar Metastable on the Discharge Structure in Ar and N_2 Mixture in RF Discharges at 13.56 MHz ( Plasma Processing)
• Two-Dimensional Modeling of Spatiotemporal Structure of Inductively Coupled Plasma
• Dependence of Driving Frequency on Capacitively Coupled Plasma in CF_4
• A Study of the Sustaining Mechanism in an Inductively Coupled Plasma ( Plasma Processing)
• Two-Dimensional Transport of Submicron Particles in Capacitively Coupled Plasma Reactor
• Phase Transitions in DC Discharges in SiH_4
• Optical Emission Spectroscopy of Pulsed Inductively Coupled Plasma in Ar : Nuclear Science, Plasmas, and Electric Discharges
• Two-Dimensional Self-Consistent Simulation of a DC Magnetron Discharge
• Experimental Study of Very-High-Frequency Plasmas in H_2 by Spatiotemporally Resolved Optical Emission Spectroscopy ( Plasma Processing)
• Rare Gas Metastable Atom Density in Diluted O_2 RF Plasmas
• A Numerical Study of a Collision-Dominated Inductively Coupled Plasma Using Particle-in-Cell/Monte Carlo Simulation
• Effect of Surface Material on Spatiotemporal Structure in O_2 RF Glow Discharge
• The Radical Transport in the Narrow-Gap-Reactive-Ion Etcher in SF_6 by the Relaxation Continuum Model
• Theoretical Analysis of Electron Velocity Distribution Functions and Transport Coefficients in HCl in a DC Electric Field
• A Novel Sustaining Mechanism in Capacitively Coupled Radio Frequency Plasma in Oxygen
• A novel sustaining mechanism in capacitively coupled radiofrequency plasma
• Numerical Study of the Effects of Frequency in Inductively Coupled Plasma Using Particle-in-Cell/Monte Carlo Simulation
• Effects of Plasma Molding on Feature Profile of Silicon Micro-Electro-Mechanical Systems through Flux Ion Velocity Distributions in Two-Frequency Capacitively Coupled Plasma in SF6/O2
• Influence of the Finite Mass-Ratio on the Charged-Particle Transport in Gases
• Time-Dependent RF Swarm Transport by Direct Numerical Procedure of the Boltzmann Equation ( Plasma Processing)
• Measurement of Amount of Pattern Trim and Surface Chemistry for Organic Resist Etching in an Inductively Coupled Plasma in SO2–O2 Gas Mixtures
• Evaluation of Errors in Feedback Control Based on Persistence Prediction in Model-Based Process Controller System for Deep Sub-100 nm Gate Fabrication
• Self-Consistent Modeling of Feature Profile Evolution in Plasma Etching and Deposition
• Modeling of Feature Profile Evolution in SiO2 as functions of Radial Position and Bias Voltage under Competition among Charging, Deposition, and Etching in Two-Frequency Capacitively Coupled Plasma
• Transport Coefficients for Electrons in Mixtures of Ar and HBr
• Two-Dimensional Transport of Submicron Particles in Capacitively Coupled Plasma Reactor
• A Numerical Study of a Collision-Dominated Inductively Coupled Plasma Using Particle-in-Cell/Monte Carlo Simulation

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