Two-Dimensional Transport of Submicron Particles in Capacitively Coupled Plasma Reactor
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概要
- 論文の詳細を見る
We show a series of two-dimensional (2D) space distributions of submicron insulating particles in Ar rf-capacitively coupled plasma (CCP) as a function of time after injection by using a fluid model under the external conditions of 102 sccm < flow rate < 105 sccm and 10-8 m < particle radius < 10-5 m at 13.56 MHz in Ar. The final density profile is strongly dependent on the flow rate. For low flow rates, the profile of density is disk shaped at low pressure and dome shaped at high pressure. As the flow rate increases, the profile becomes ring shaped, and finally all particles are exhausted. There is a linear relation between the flow rate and the minimum radius of a particle which can be exhausted. It was found that high pressure, low voltage and strong gas flow are the most effective for the purpose of exhausting particles from the reactor.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1997-06-15
著者
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Nakano Nobuhiko
Department Of Electrical Engineering Faculty Of Science And Technology Keio University
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Makabe Toshiaki
Department Of Electrical Engineering Faculty Of Science And Technology Keio University
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HASHIDO Ryu-ichi
Department of Electrical Engineering, Faculty of Science and Technology, Keio University
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YAMAGUCHI Yukio
Yokohama Research Center, Mitsubishi Chemical Corporation
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Hasebe Masao
Department Of Electrical Engineering Faculty Of Science And Technology Keio University
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Hosokawa Yoshiyuki
Mechanical Engineering Research Laboratory, KOBE STEEL, Ltd., Takatukadai, Kobe 651, Japan
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Makabe Toshiaki
Department of Electrical Engineering, Faculty of Science and Technology, Keio University, Hiyoshi, Yokohama 223, Japan
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Hasebe Masao
Department of Electrical Engineering, Faculty of Science and Technology, Keio University, Hiyoshi, Yokohama 223, Japan
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