Three Dimensional Optical Emission Tomography of an Inductively Coupled Plasma

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1997-07-01

著者

• Nakano Nobuhiko

  Faculty Of Science And Technology Department Of Electrical Engineering Keio University

• Itoh A

  Ricoh Co. Ltd. Miyagi Jpn

• OKIGAWA Akifumi

  Faculty of Science and Technology, Department of Electrical Engineering, Keio University

• TADOKORO Masahiro

  Faculty of Science and Technology, Department of Electrical Engineering, Keio University

• ITOH Akihiko

  Shibaura Engineering Works Co., Ltd.

• PETROVIC Zoran

  Faculty of Science and Technology, Department of Electrical Engineering, Keio University

• MAKABE Toshiaki

  Faculty of Science and Technology, Department of Electrical Engineering, Keio University

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• Step-Controlled Epitaxial Growth of 4H-SiC and Doping of Ga as a Blue Luminescent Center
• Application of Reversed Silicon Wafer Direct Bonding to Thin-Film SOI Power ICs
• Application of Reversed Silicon Wafer Direct Bonding to Thin-Film SOI Power Ics
• Analysis of Short-Channel Schottky Source/Drain Metal-Oxide-Semiconductor Field-Effect Transistor on Silicon-on-Insulator Substrate and Demonstration of Sub-50-nm n-type Devices with Metal Gate
• Scanning Tunneling Spectroscopy Study of Fe(001) Using Nonmagnetic W- and Fe-Evaporated Probe Tips
• 35 nm Metal Gate p-type Metal Oxide Semiconductor Field-Effect Transistor with PtSi Schottky Source/Drain on Separation by Implanted Oxygen Substrate
• Element-Specific Image and Local Work Function of Fe Submonolayer Film on Au (001) Studied by Scanning Tunneling Microscopy
• Fabrication and Characteristics of a Field Effect Transistor Using CdF_2/CaF_2 Heterostructures on a Si Substrate
• Scanning Tunneling Microscopy Study of Fe Submonolayer Film on Vicinal Au(001)
• Photoresist Chemical Mechanical Polishing for Shallow Trench Isolation
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• Three Dimensional Optical Emission Tomography of an Inductively Coupled Plasma
• Advanced SOI Devices Using CMP and Wafer Bonding
• Robot Assisted Optical Emission Tomography in an Inductively Coupled Plasma Reactor
• Drift Velocities of Electrons in Time Varying Electric Fields
• Effect of Surface Material on Spatiotemporal Structure in O_2 RF Glow Discharge
• Multiple-collision zones in the Sanjiang Region, SW China
• The Radical Transport in the Narrow-Gap-Reactive-Ion Etcher in SF_6 by the Relaxation Continuum Model
• A Novel Sustaining Mechanism in Capacitively Coupled Radio Frequency Plasma in Oxygen
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• Three Dimensional Optical Emission Tomography of an Inductively Coupled Plasma

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