BCN膜の微細構造への大気中熱処理の影響

概要

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Boron-Carbon-Nitrogen (BCN) films are deposited on Si (100) substrates by RF sputtering with a mixture of N2 and Ar gases using a target of graphite combined with semi-circled B4C. The compositional analysis is carried out by energy dispersive X-ray spectroscopy (EDX). The microstructure and mechanical properties are examined by fourier transformation infrared spectroscopy (FT-IR), atomic force microscopy (AFM) and nanoindentation measurements. The results of FT-IR show the presence of h-BN bonds and evidences in support of B-C, C-N, C=N, C=C and C≡N bonds. In additon, the C content of the films can be changed in the range of 13−45% according to the sample position. Hardness of the films is increased from 8 to 18GPa with increasing C content. After thermal annealing at 600ºC in air, h-BN bonds in the films are not affected significantly although the samples are oxidized. However, the hardness of the samples is abruptly reduced to 4GPa for all samples. From AFM observation, it is assumed that the development of the void-like structure is responsible for the reduction in hardness.
2006-10-01