Characteristics of Very-High-Frequency-Excited SiH_4 Plasmas using a Ladder-Shaped Electrode
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2001-05-01
著者
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KAWAI Yoshinobu
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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Kawai Yoshinobu
Welding Research Institute Osaka University
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Kawai Yoshinobu
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
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Kawai Yasunobu
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
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Kawai Yoshinobu
Interdiciplinary Gradate School Of Engineering Sciences Kyushu University
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Kawai Y
Welding Research Institute Osaka University
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Kawai Y
Kyushu Univ. Fukuoka Jpn
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TAKEUCHI Yoshiaki
Nagasaki Research & Development Center, Mitsubishi Heavy Industries Ltd.
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MASHIMA Hiroshi
Nagasaki Research & Development Center, Mitsubishi Heavy Industries Ltd.
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MURATA Masayoshi
Nagasaki Research & Devepolment Center, Mitsubishi Heavy Industries Ltd.
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UCHINO Satoshi
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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Kawai Y
Mitsubishi Materials Silicon Corporation
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Takeuchi Yasunori
Kek National Laboratory For High Energy Physics
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河合 良信
Kyushu Univ. Fukuoka
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Takeuchi Y
Institute For Materials Research Tohoku University
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Murata M
Nagasaki Research & Devepolment Center Mitsubishi Heavy Industries Ltd.
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Murata Makoto
Division Of Biological Sciences Graduate School Of Science Hokkaido University
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Uchino Satoshi
Department Of Applied Physics Graduate School Of Engineering Hokkaido University
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Mashima Hiroshi
Nagasaki Research & Devepolment Center Mitsubishi Heavy Industries Ltd.
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Uchino Satoshi
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
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