Production of Inductively Coupled RF Plasma Using a Ladder-Shaped Antenne
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1997-07-01
著者
-
KAWAI Yoshinobu
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
-
Kawai Yoshinobu
Welding Research Institute Osaka University
-
Kawai Yoshinobu
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
-
Kawai Yasunobu
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
-
Kawai Yoshinobu
Interdiciplinary Gradate School Of Engineering Sciences Kyushu University
-
Kawai Y
Welding Research Institute Osaka University
-
Kawai Y
Kyushu Univ. Fukuoka Jpn
-
MURATA Masayoshi
Nagasaki Research & Devepolment Center, Mitsubishi Heavy Industries Ltd.
-
MASHIMA Hiroshi
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
-
YOSHIOKA Masao
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
-
NISHIDA Seiichi
Nagasaki Research & Development Center, Mitsubishi Heavy Industries Ltd.
-
MORITA Syoji
Nagasaki Research & Development Center, Mitsubishi Heavy Industries Ltd.
-
Kawai Y
Mitsubishi Materials Silicon Corporation
-
河合 良信
Kyushu Univ. Fukuoka
-
Morita Syoji
Nagasaki Research & Development Center Mitsubishi Heavy Industries Ltd.
-
Murata M
Nagasaki Research & Devepolment Center Mitsubishi Heavy Industries Ltd.
-
Murata Makoto
Division Of Biological Sciences Graduate School Of Science Hokkaido University
-
Yoshioka Masao
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
-
Mashima Hiroshi
Nagasaki Research & Devepolment Center Mitsubishi Heavy Industries Ltd.
-
Nishida Seiichi
Nagasaki Research & Development Center Mitsubishi Heavy Industries Ltd.
-
Mashima Hiroshi
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816, Japan
関連論文
- Measurement of Edge Density Profiles and Fluctuations in the H-Mode Discharge of the Compact Helical System (CHS) with a Thermal Neutral Lithium Beam Probe
- 27aC26P 負イオンプラズマ中のイオン音波slowモードの支配的伝播(プラズマ基礎・応用)
- 27pA03P 3成分イオンプラズマ中のイオン音波伝播特性(プラズマ基礎・応用)
- Reconstruction of Edge-Plasma Density Profiles by Neutral Beam Probe Spectroscopy
- 28p-C-2 ECRプラズマ中のイオンおよび中性原子温度の測定
- 24aD-7 Ar/SF_6プラズマ中のイオン音波伝播
- 25aYG-11 イオンバーストを用いた多種イオンプラズマ測定
- ArF Excimer Laser Projection Lithography Using Partially Achromatized Lens System : Lithography Technology
- ArF Excimer Laser Projection Lithography Using Partially Achromatized Lens System
- Behavior of Time-Resolved Ion Energy Distribution Functions during Ion-Ion Instability
- 12p-M-7 斜め入射のイオンビームによるイオン-イオン不安定性の励起とその外場による抑制
- Suppression of Ion-Ion Instabilities Excited by an Obliquely Injected Ion Beam
- 29p-ZE-13 電子ビーム・プラズマ系での不安定モード(プラズマ物理・核融合)
- 27p-G-6 外場によるイオン-イオン不安定性の抑制とイオンのエネルギー分布関数の変化
- 2p-R-5 イオン-イオン不安定性の外場による抑制とイオンのエネルギー分布関数
- 27pA04P 2種類の負イオンを含む多成分系プラズマ中のイオン音波(プラズマ基礎・応用)
- Production of a Large-Diameter Uniform ECR Plasma with a Lisitano Coil : Nuclear Science, Plasmas and Electric Discharges
- Impurity Ions in a Plasma Produced by Electron Cyclotron Resonance Heating : Nuclear Science, Plasmas and Electric Discharges
- Flute Stabilization of a Mirror-Confined Plasma by a Positive Ambipolar Potential
- Electron Cyclotron Wave Plasma Production Using a Concave Lens
- 28a-Q-12 マイクロ波凹レンズを用いた大口径高密度プラズマの生成
- 29a-YB-11 マルチプレートランチャーによる大口径・高密度プラズマの生成
- 12a-M-7 ヘリコン波によって生成されたプラズマ中の電子ビームIII
- 26p-C-12 ヘリコン波によって生成されたプラズマ中の電子ビーム II
- 27a-Z-6 ヘリコン波によって生成されたプラズマ中の電子ビーム
- Effect of Electromagnetic Waves Propagating in the Periphery of Electron Cyclotron Resonance Plasma on the Uniformity
- Three-Dimensional Simulation of Microwave Propagation in an Electron Cyclotron Resonance Plasma
- One-Dimensional Simulation of Microwave Propagation in Electron Cyclotron Resonance Plasmas
- Characteristics of Very High Frequency Plasma Produced with Ladder-Shaped Electrode at High Pressure
- Characteristics of Very-High-Frequency-Excited SiH_4 Plasmas using a Ladder-Shaped Electrode
- Characteristics of Very High Frequency Plasma Produced Using a Ladder-Shaped Electrode
- Production of Inductively Coupled RF Plasma Using a Ladder-Shaped Antenne
- 7a-YN-9 バイポーラ型反射電極を用いたイオン音波ソリトン及びバーストの反射
- 29a-YG-10 イオン波の分散特性に対する負イオンの効果
- 負イオンプラズマ中のイオン波の励起特性
- 負イオンプラズマ中のイオン波の分散関係
- 27a-Q-12 負イオンプラズマ中のイオン波の分散関係
- Dynamic Formation of Excited Helicon Wave Structure and Estimation of Wave Energy Flux Distribution
- Dynamic Behavior of Helicon Wave Produced Plasma
- Suppression of Ion-Ion Instabilities by an External Field
- Effect of Native Oxide upon Formation of Amorphous SiO_x Layer at the Interface of Directly Bonded Silicon Wafers
- 25a-D-4 波動モードとプラズマ生成
- 3p-R-2 電子サイクロトロン波を用いた高密度プラズマの生成 : 斜め入射
- Overdense Plasma Production Using Electron Cyclotron Waves
- 28a-Q-13 ECWプラズマ中の高速電子群発生とミラー磁場配位の関係
- 3p-W-3 電子サイクロトロン波プラズマにおける密度転移の伝播
- 30p-YB-14 電子サイクロトロン波プラズマ中の電子のカオス的加速
- 30p-YB-11 電子サイクロトロン波プラズマにおける密度転移現象III
- 12p-M-2 L-波のトンネル効果と電子サイクロトロン波の励起
- 12p-M-1 電子サイクロトロン波プラズマにおける密度転移現象II
- 30a-ZE-11 対向入射マイクロ波による高密度ECWプラズマの生成(プラズマ物理・核融合(プラズマ基礎))
- 30a-ZE-10 電子サイクロトロン波プラズマにおける密度転移現象(プラズマ物理・核融合(プラズマ基礎))
- 26p-C-11 L波から電子サイクロトロン波へのモード変換
- 26p-C-8 電子サイクロトロン波プラズマのカオス過程とX線放射
- 27a-Z-5 電子サイクロトロン波プラズマからのX線放射II
- 27a-Z-3 波動モードとプラズマ生成II
- 27p-G-7 電子サイクロトロン波プラズマからのX線放射
- 28p-Q-3 電子サイクロトロン波プラズマにおける渦構造の発生
- 28p-Q-2 電子サイクロトン波プラズマにおける密度転移現象とプラズマの流れ場
- Patterning Yield of Sub-100-nm Holes Limited by Fluctuation of Exposure and Development Reactions in Synchrotron Radiation Lithography Using Biased Mask Patterns
- Lithographic Performance of a Chemically Amplified Resist Developed for Synchrotron Radiation Lithography in the Sub-100-nm Region
- Dissolution Characteristics and Surface Morphology of Chemically Amplified Resists in X-Ray Lithography
- Production of ECR Mirror Plasma by High Power Millimeter-Wave Radiation : Nuclear Science, Plasmas and Electric Discharges
- 26p-C-7 準周期ルートによるイオンシースのカオス
- 28a-Q-11 負イオンを含む多成分プラズマのイオンシース中の現象
- Observations of Subharmonic Waves in an Electron Beam Plasma System
- Electron Heating and Control of RF-Produced Plasma Parameters Excited by a Planar, Spiral Antenna
- Effects of Axial Magnetic Field and Faraday Shield on Characteristics of RF Produced Plasma Using Spiral Antenna
- Waveform of Linear Ion-Acoustic Waves Excited by a Mesh Grid
- Reflection of Ion Waves from a Bipolar Electrode in an Ion Beam-Plasma System
- New Microwave Launcher for Producing ECR Plasmas without Window Contamination I. : Excitation of Electron Cyclotron Wave
- ECR Plasma CVD in Different Magnetic Field Configurations
- Chaotic Behavior of Current-Carrying Plasmas in External Periodic Oscillations
- Stress-Enhanced Diffusion of Boron at the Interface of a Directly Bonded Silicon Wafer
- ECR Plasma CVD Using a Slotted Lisitano Coil
- Comments on the Reflection/Excitation Properties of a Bipolar Potential Structure Used in Ion Wave Experiments : Nuclear Sciences, Plasmas, and Electric Discharges
- Measurement of Ion Species Utilizing Ion-Bursts in an Ar/SF_6 Mixture Plasma
- Estimation of Electric Fields from Magnetic Field Distributions and an Application to Helicon Wave
- Skin Depth of Electromagnetic Waves in Plasma with Magnetic Field and Collisions
- Stochastic Electron Acceleration by an Electron Cyclotron Wave Propagating in an Inhomogeneous Magnetic Field
- 27p-G-8 イオンシースにおけるカオス現象の解析
- Estimate of the Negative-Ion Density in O_2/Ar ECR Plasma Utilizing Ion Acoustic Waves : Fluids, Plasmas, and Electric Discharges
- Phantom Exposure of Chemically Amplified Resist in KrF Excimer Laser Lithography
- 30p-YQ-13 バイポーラ型反射電極を用いたイオン音波ソリトン及びバーストの反射 II
- Advances in Patterning Characteristics of Chemically Amplified Resists with an Organic Base
- Multiplate Microwave Launcher for Producing High-Density Electron Cyclotron Resonance Plasmas
- Propagation Characteristics of Ion Acoustic Waves in an Ar/SF_6 Plasma
- Production Mechanism of a Large-Diameter Uniform Electron Cyclotron Resonance Plasma Generated by a Circular TE_ Mode Microwave
- 8" Uniform Electron Cyclotron Resonance Plasma Source Using a Circular TE_ Mode Microwave
- Excitation Characteristics of Ion Waves in a Negative Ion Plasma
- 12p-L-5 CHSのHモード的放電における周辺プラズマ
- New Resist Technologies for 0.25-μm Wiring Pattern Fabrication with KrF Lithography
- Spatial Frequency Doubling Method by Image Superimposition for Sub-0.15-μm Optical Lithography
- 27p-Q-9 電子ビーム・プラズマ系における分岐現象
- Spatial Frequency Doubling Method for Sub-0.15-μm Optical Lithography
- Effect of Overcoats in Chemically Amplified Resists against Water and Organic Bases
- The Effect of an Organic Base in Chemically Amplified Resist on Patterning Characteristics Using KrF Lithography
- Parameters Measurement of ECR Silane Plasma
- Production of Low-Electron-Temperature Electron Cyclotron Resonance Plasma Using Nitrogen Gas in the Mirror Magnetic Field
- Observation of Synchronization of Two Chaotic Oscillators in Plasma