Overdense Plasma Production Using Electron Cyclotron Waves

概要

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The density limit in ECR plasma production is overcome using electron cyclotronwaves. The plasma of 3 X 10" cm-' density is achieved by parallel injection of circu-tardy polarized microwaves with a frequency 2.45 GHz, corresponding to a 400 timeshigher density than ordinary mode cutoff. It is found that the plasma is produced inthe high field side region between the incident position and the ECR point, and this isdue to the generation of high energy electrons and the Doppler-shifted cyclotronresonance.[ECR, overdense plasma, electron cyclotron wave, plasma production, wave pro- ]l pagationl
社団法人日本物理学会の論文
1991-05-15