SARAYA Takuya | Institute Industrial Science, The University of Tokyo
スポンサーリンク
概要
関連著者
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SARAYA Takuya
Institute Industrial Science, The University of Tokyo
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HIRAMOTO Toshiro
Institute Industrial Science, The University of Tokyo
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Hiramoto Toshiro
Institute Of Industrial Science The University Of Tokyo
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SARAYA Takuya
Institute of Industrial Science, University of Tokyo
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SARAYA Takuya
The Institute of Industrial Science, The University of Tokyo
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Saraya Takuya
The Institute Of Industrial Science The University Of Tokyo
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Duyet Tran
Institute Of Industrial Science University Of Tokyo
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Hiramoto Toshiro
Institute Of Industrial Science University Of Tokyo
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Ishikuro Hiroki
Institute Of Industrial Science University Of Tokyo
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Takamiya Makoto
Institute Of Industrial Science The University Of Tokyo
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TAKAMIYA Makoto
Institute of Industrial Science, University of Tokyo
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Takamiya Makoto
Institute Of Industrial Science University Of Tokyo
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ISHIKURO Hiroki
Institute of Industrial Science, University of Tokyo
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Ishikuro H
Univ. Tokyo Tokyo Jpn
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Mao Ke
Institute of Industrial Science, University of Tokyo, Meguro, Tokyo 153-8505, Japan
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Shi Yi
Institute Of Biophysics Academia Sinica
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IKOMA Toshiaki
Texas Instruments Tsukuba R&D Center
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KUMAR Anil
Institute Industrial Science, The University of Tokyo
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Shi Yi
Institute Of Industrial Science University Of Tokyo:department Of Physics Nanjing University
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Yasuda Yukio
School Of Electrical Engineering And Electronics Toyohashi University Of Technology
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Hiramoto Toshiro
Vlsi Design And Education Center University Of Tokyo
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YASUDA Yuri
Institute of Industrial Science, University of Tokyo
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Yasuda Y
Univ. Tokyo Tokyo Jpn
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Yasuda Yuri
Institute Of Industrial Science University Of Tokyo:chuo University
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Ikoma T
Univ. Tokyo Tokyo Jpn
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Ikoma Toshiaki
The Institute Of Industrial Science The University Of Tokyo
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Miyano Shinji
Semiconductor Technology Academic Research Center
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Nozue Motoki
Institute of Industrial Science, University of Tokyo, Meguro, Tokyo 153-8505, Japan
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Suzuki Ryota
Institute of Industrial Science, University of Tokyo, Meguro, Tokyo 153-8505, Japan
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SAITO Keisuke
Application Laboratory
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Saito Keisuke
Application Laboratory Analytical Division Philips Japan Ltd.
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Saito K
Institute Of Industrial Science University Of Tokyo
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HASHIGUCHI Gen
Institute of Industrial Science, University of Tokyo
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Fujii T
Institute Of Industrial Science University Of Tokyo
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FUJII Tomoyuki
Institute of Industrial Science, University of Tokyo
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SAITO Kenichi
Institute of Industrial Science, University of Tokyo
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HASHIGUCHI Gen
Faculty of Engineering, Kagawa University
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Saito Kenichi
Institute Of Industrial Science University Of Tokyo
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Hiramoto Toshiro
Vlsi Design And Education Center The University Of Tokyo
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Fujii T
Tohoku Univ. Sendai Jpn
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Saito Kunio
Ntt Microsystem Integration Laboratories
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Hashiguchi G
Faculty Of Engineering Kagawa University
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Saito K
Akita Univ. Akita Jpn
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Mizutani Tomoko
Institute Of Industrial Science The University Of Tokyo
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Saito Keisuke
Application Laboratory Bruker Axs
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Shimizu Ken
Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan
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Takuya Saraya
Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
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Ikoma Toshiaki
Texas Instruments Tsukuba Research & Development Center Ltd., 17 Miyukigaoka, Tsukuba, Ibaraki 305, Japan
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Hiramoto Toshiro
Institute of Industrial Science, University of Tokyo, 7–22–1 Roppongi, Minato-ku, Tokyo 106, Japan
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Ishikuro Hiroki
Institute of Industrial Science, University of Tokyo, 7–22–1 Roppongi, Minato-ku, Tokyo 106, Japan
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KUMAR Anil
Institute of Industrial Science, The University of Tokyo
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Shi Yi
Institute of Industrial Science, University of Tokyo, 7-22-1 Roppongi, Minato-ku, Tokyo 106-8558, Japan
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Saraya Takuya
Institute of Industrial Science, University of Tokyo, Meguro, Tokyo 153-8505, Japan
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Saraya Takuya
Institute of Industrial Science, University of Tokyo, 7-22-1 Roppongi, Minato-ku, Tokyo 106-8558, Japan
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ALIAS Nurul
Institute Industrial Science, The University of Tokyo
著作論文
- Fabrication of Si Nanostructures for Single Electron Device Applications by Anisotropic Etching
- High Performance Accumulated Back-Interface Dynamic Threshold SOI MOS-FET's (AB-DTMOS) with Large Body Effect at Low Supply Voltage
- Measurement of Energetic and Lateral Distribution of Interface State Density in Fully-Depleted Silicon on Insulator Metal-Oxide-Semiconductor Field-Effect Transistors
- High-Performance Accumulated Back-Interface Dynamic Threshold SOI MOSFET (AB-DTMOS) with Large Body Effect at Low Supply Voltage
- Measurement of Energetic and Lateral Distribution of Interface State Density in FD SOI MOSFETs
- Suppression of Geometric Component of Charge Pumping Current in Thin Film Silicon on Insulator Metal-Oxide-Semiconductor Field-Effect Transistors
- New Measurement Technique for Sub-Bandgap Impact Ionization Current by Transient Characteristics of Partially Depleted SOI MOSFETs
- Extremely Large Amplitude of Random Telegraph Signals in a Very Narrow Split-Gate MOSFET at Low Temperatures
- Suppression of Within-Device Variability in Intrinsic Channel Tri-Gate Silicon Nanowire Metal-Oxide-Semiconductor Field-Effect Transistors (Special Issue : Solid State Devices and Materials (1))
- Superior $\langle 110\rangle$-Directed Electron Mobility to $\langle 100\rangle$-Directed Electron Mobility in Ultrathin Body (110) n-Type Metal–Oxide–Semiconductor Field-Effect Transistors
- Extremely Large Amplitude Random Telegraph Signals in a Very Narrow Split-Gate MOSFET at Low Temperatures
- Integration of Complementary Metal--Oxide--Semiconductor 1-Bit Analog Selectors and Single-Electron Transistors Operating at Room Temperature
- Effects of Side Surface Roughness on Carrier Mobility in Tri-Gate Single Silicon Nanowire Metal--Oxide--Semiconductor Field-Effect Transistors
- Direct Measurement of Carrier Mobility in Intrinsic Channel Tri-Gate Single Silicon Nanowire Metal--Oxide--Semiconductor Field-Effect Transistors
- Experimental Demonstration of Post-Fabrication Self-Improvement of SRAM Cell Stability by High-Voltage Stress
- NBTI Reliability of PFETs under Post-Fabrication Self-Improvement Scheme for SRAM
- Measurement of Energetic and Lateral Distribution of Interface State Density in Fully-Depleted Silicon on Insulator Metal-Oxide-Semiconductor Field-Effect Transistors
- Direct Measurement of Carrier Mobility in Intrinsic Channel Tri-Gate Single Silicon Nanowire Metal-Oxide-Semiconductor Field-Effect Transistors (Special Issue : Solid State Devices and Materials)
- Integration of Complementary Metal-Oxide-Semiconductor 1-Bit Analog Selectors and Single-Electron Transistors Operating at Room Temperature (Special Issue : Solid State Devices and Materials)