Ishikuro H | Univ. Tokyo Tokyo Jpn
スポンサーリンク
概要
関連著者
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Hiramoto Toshiro
Institute Of Industrial Science University Of Tokyo
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ISHIKURO Hiroki
Institute of Industrial Science, University of Tokyo
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Ishikuro H
Univ. Tokyo Tokyo Jpn
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Hiramoto Toshiro
Institute Of Industrial Science The University Of Tokyo
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Ishikuro Hiroki
Institute Of Industrial Science University Of Tokyo
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HIRAMOTO Toshiro
Institute Industrial Science, The University of Tokyo
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SARAYA Takuya
Institute of Industrial Science, University of Tokyo
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Shi Yi
Institute Of Industrial Science University Of Tokyo:department Of Physics Nanjing University
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Shi Yi
Institute Of Biophysics Academia Sinica
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SARAYA Takuya
The Institute of Industrial Science, The University of Tokyo
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Saraya Takuya
The Institute Of Industrial Science The University Of Tokyo
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SARAYA Takuya
Institute Industrial Science, The University of Tokyo
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SAITO Keisuke
Application Laboratory
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Saito Keisuke
Application Laboratory Analytical Division Philips Japan Ltd.
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Saito K
Institute Of Industrial Science University Of Tokyo
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SAITO Kenichi
Institute of Industrial Science, University of Tokyo
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Saito Kenichi
Institute Of Industrial Science University Of Tokyo
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Saito Kunio
Ntt Microsystem Integration Laboratories
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Saito K
Akita Univ. Akita Jpn
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Saito Keisuke
Application Laboratory Bruker Axs
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Duyet Tran
Institute Of Industrial Science University Of Tokyo
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IKOMA Toshiaki
Texas Instruments Tsukuba R&D Center
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TAKAMIYA Makoto
Institute of Industrial Science, University of Tokyo
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Takamiya Makoto
Institute Of Industrial Science University Of Tokyo
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Takamiya Makoto
Institute Of Industrial Science The University Of Tokyo
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Ikoma T
Univ. Tokyo Tokyo Jpn
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Ikoma Toshiaki
The Institute Of Industrial Science The University Of Tokyo
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HASHIGUCHI Gen
Institute of Industrial Science, University of Tokyo
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Fujii T
Institute Of Industrial Science University Of Tokyo
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FUJII Tomoyuki
Institute of Industrial Science, University of Tokyo
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HASHIGUCHI Gen
Faculty of Engineering, Kagawa University
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TAKAHASHI Nobuyoshi
Institute of Industrial Science, University of Tokyo
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Fujii T
Tohoku Univ. Sendai Jpn
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Hashiguchi G
Faculty Of Engineering Kagawa University
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Hiramoto Toshiro
The Institute Of Industrial Science The University Of Tokyo:vlsi Design And Education Center The Uni
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IKOMA Toshiaki
Institute of Industrial Science, University of Tokyo
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SAITOH Masumi
Institute of Industrial Science, University of Tokyo
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YASUDA Yuri
Institute of Industrial Science, University of Tokyo
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INUKAI Takashi
The Institute of Industrial Science, The University of Tokyo
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INUKAI Takashi
Institute of Industrial Science, University of Tokyo
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NAGATA Eiji
Institute of Industrial Science, University of Tokyo
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Inukai T
The Institute Of Industrial Science The University Of Tokyo
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Nagata Eiji
Institute Of Industrial Science University Of Tokyo:chuo University
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Yasuda Yuri
Institute Of Industrial Science University Of Tokyo:chuo University
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Inukai Takashi
Institute Of Industrial Science The University Of Tokyo
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Ikoma Toshiaki
Institute Of Industrial Science The University Of Tokyo
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Takahashi N
Institute Of Industrial Science University Of Tokyo
著作論文
- Room Temperature Coulomb Blockade and Low Temperature Hopping Transport in a Multiple-Dot-Channel Metal-Oxide-Semiconductor Field-Effect-Transistor ( Quantum Dot Structures)
- Fabrication of Si Nanostructures for Single Electron Device Applications by Anisotropic Etching
- Characteristic Distributions of Narrow Channel Metal-Oxide-Semiconductor Field-Effect Transistor Memories with Silicon Nanocrystal Floating Gates
- Measurement of Energetic and Lateral Distribution of Interface State Density in Fully-Depleted Silicon on Insulator Metal-Oxide-Semiconductor Field-Effect Transistors
- Measurement of Energetic and Lateral Distribution of Interface State Density in FD SOI MOSFETs
- Suppression of Geometric Component of Charge Pumping Current in Thin Film Silicon on Insulator Metal-Oxide-Semiconductor Field-Effect Transistors
- Characteristics of Narrow Channel MOSFET Memory Based on Silicon Nanocrystals
- Effects of Interface Traps on Charge Retention Characteristics in Silicon-Quantum-Dot-Based Metal-Oxide-Semiconductor Diodes
- Characteristics of Narrow Channel MOSFET Memory Based on Silicon Nanocrystals
- Extremely Large Amplitude Random Telegraph Signals in a Very Narrow Split-Gate MOSFET at Low Temperatures
- Extremely Large Amplitude of Random Telegraph Signals in a Very Narrow Split-Gate MOSFET at Low Temperatures
- Large Electron Addition Energy above 250 meV in a Silicon Quantum Dot in a Single-Electron Transistor