Characteristics of a Multilayer SiOx(CH)yNz Film Deposited by Low Temperature Plasma Enhanced Chemical Vapor Deposition Using Hexamethyldisilazane/Ar/N2O
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概要
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SiOx(CH)yNz films were deposited at room temperature using plasma enhanced chemical vapor deposition (PECVD) with a gas mixture of hexamethyldisilazane [HMDS, Si2NH(CH3)6]/Ar/N2O. The characteristics of those films with increasing N2O were investigated. When no N2O was used, the film showed organic characteristics with a Si/O composition ratio of 2 and a large concentration of –CHx and N–H in the deposited film. However, with increasing N2O flow rate, oxygen-rich and transparent SiO2-like inorganic thin films could be obtained with a Si/O composition ratio of 0.5 and a lower –CHx and N–H in the deposited film. By turning on-and-off the N2O gas flow during SiOx(CH)yNz deposition, a multi-layer thin film consisting of an organic Si(CH)x-like film/inorganic SiO2-like thin film, which can be applied to the thin film passivation for organic devices could be successfully deposited.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-10-30
著者
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Lee June
Department Of Advanced Materials Science And Engineering Sungkyunkwan University
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ZAVALEYEV Viktor
Department of Materials Science & Engineering, Sungkyunkwan University
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KYUNG Se
Department of Materials Science & Engineering, Sungkyunkwan University
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Jeong Chang
Department Of Advanced Materials Science And Engineering Sungkyunkwan University
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Lim Jong
Department Of Advanced Materials Science And Engineering Sungkyunkwan University
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Yeom Geun
Department Of Advanced Materials Science And Engineering Sungkyunkwan University
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Yeom Geun
Department of Materials Science & Engineering, Sungkyunkwan University, Chunchun-dong, Jangan-gu, Suwon, 440-746, Korea
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Lim Jong
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon, Gyunggi-do 440-746, Korea
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Lee June
Department of Materials Science & Engineering, Sungkyunkwan University, Chunchun-dong, Jangan-gu, Suwon, 440-746, Korea
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Jeong Chang
Department of Materials Science & Engineering, Sungkyunkwan University, Chunchun-dong, Jangan-gu, Suwon, 440-746, Korea
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Yeom Geun
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon, Gyunggi-do 440-746, Korea
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Zavaleyev Viktor
Department of Materials Science & Engineering, Sungkyunkwan University, Chunchun-dong, Jangan-gu, Suwon, 440-746, Korea
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Kyung Se
Department of Materials Science & Engineering, Sungkyunkwan University, Chunchun-dong, Jangan-gu, Suwon, 440-746, Korea
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Yeom Geun
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic Korea
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