Effect of N_2O to C_4F_8/O_2 on Global Warming during Silicon Nitride Plasma Enhanced Chemical Vapor Deposition (PECVD) Chamber Cleaning Using a Remote Inductively Coupled Plasma Source : Nuclear Science, Plasmas, and Electric Discharges
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-12-15
著者
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KIM Ji
Department of Polymer Science and Engineering, Kumoh National Institute of Technology
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LEE Nae
Department of Chemistry and Biotechnology, School of Engineering, The University of Tokyo
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Yeom G
Sungkyunkwan Univ. Kyounggi Kor
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YEOM Geun
Department of Materials Science & Engineering, Sungkyunkwan University
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Kim Joon
The Institute Of Scientific And Industrial Research Osaka University
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Yeom G
Sungkyunkwan Univ. Suwon Kor
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OH Chang
Department of Materials Engineering, SungKyunKwan University
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Oh Chang
Department Of Materials Engineering Sungkyunkwan University
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Kim Ji
Department Of Anesthesiology And Pain Medicine Gachon Medical School Gil Medical Center
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Oh Chang
Department Of Biochemistry And Ilchun Molecular Medicine Institute Mrc Seoul National University Col
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Kim Jae
Photonics Research Center Korea Institute Of Science And Technology
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Kim Ji
Department Of Materials Engineering Sungkyunkwan University
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Kim J
Photonics Research Center Korea Institute Of Science And Technology
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Lee Nae
Department Of Materials Engineering Sungkyunkwan University
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Lee Nae
Department Of Chemistry And Biotechnology School Of Engineering The University Of Tokyo
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Kim J
Photonic Research Center Korea Institute Of Science And Technology
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Yeom Geun
Department Of Advanced Materials Science And Engineering Sungkyunkwan University
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LEE Nae
Department of Advanced Materials Engineering, Sejong University
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Kim Ji
Department of Advanced Materials Engineering, Sangju National University, Kyeongbuk 742-711, Korea
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Yeom Geun
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon, Gyunggi-do 440-746, Korea
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Yeom Geun
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic Korea
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