Growth of Vertically Aligned Carbon Nanotubes inside Dome-structured Amorphous Silicon Holes by Plasma-enhanced Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 2003-03-15
著者
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LEE Nae
Department of Chemistry and Biotechnology, School of Engineering, The University of Tokyo
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Kim J
Fed Team Samsung Advanced Institute Of Technology
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PARK Chong
Department of Nano Science and Technology, Sungkyunkwan University
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Jin Yong
Fed Team Samsung Advanced Institute Of Technology
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PARK Young
FED Team, Samsung Advanced Institute of Technology
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HAN In
FED Team, Samsung Advanced Institute of Technology
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KIM Ha
FED Team, Samsung Advanced Institute of Technology
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KIM Jung
FED Team, Samsung Advanced Institute of Technology
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JUNG Jae
FED Team, Samsung Advanced Institute of Technology
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KIM Jong
FED Team, Samsung Advanced Institute of Technology
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Kim Jong
Fed Team Samsung Advanced Institute Of Technology
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Lee Nae
Department Of Chemistry And Biotechnology School Of Engineering The University Of Tokyo
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Lee Nae
Department Of Nano Science And Technology Sejong University
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Park Chong
Department Of Nano Science And Technology Sungkyunkwan University
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Kim Ha
Fed Team Samsung Advanced Institute Of Technology
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Han In
Fed Team Samsung Advanced Institute Of Technology
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Jung Jae
Fed Team Samsung Advanced Institute Of Technology
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Kim Jung
Fed Team Samsung Advanced Institute Of Technology
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Park Young
Fed Team Samsung Advanced Institute Of Technology
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Park Chong
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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LEE Nae
Department of Advanced Materials Engineering, Sejong University
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