Analysis of the Atomic Structure of the Si(111)√3×√3-Bi Surface by X-Ray Photoelectron Diffraction
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概要
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It is found by X-ray photoelectron spectroscopy and LEED that the saturation coverage of Bi is one monolayer for the Si(111)√3×√3-Bi surface. Azimuthal dependence of Bi 4d photoelectron diffraction has been measured for the Si(111)√3×√3-Bi surface and analyzed kinematically. The results of the analysis have confirmed the presence of Bi-triplets with sides of 3.1 Å as proposed by X-ray diffraction. It is further found that the Bi-triplets form an overlayer on the substrate.
- 社団法人応用物理学会の論文
- 1987-08-20
著者
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Kono Shozo
Department Of Physics Faculty Of Science Tohoku University
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Abukawa Tadashi
Department Of Physics
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Abukawa Tadashi
Department Of Physics Faculty Of Science Tohoku University
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PARK Chong
Department of Nano Science and Technology, Sungkyunkwan University
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Park Chong
Department Of Physics Faculty Of Science Tohoku University:department Of Physics Sung Kyun Kawan Uni
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Park Chong
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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HIGASHIYAMA Kazuyuki
Department of Physics, Faculty of Science, Tohoku University
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Higashiyama Kazuyuki
Department Of Physics Faculty Of Science Tohoku University
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Higashiyama Kazuyuki
Department Of Physics Faculty Of Science Tohoku University:(present Address) Institute Of Physics Un
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