Characteristics of a Multilayer SiO_x(CH)_yN_z Film Deposited by Low Temperature Plasma Enhanced Chemical Vapor Deposition Using Hexamethyldisilazane/Ar/N_2O
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概要
- 論文の詳細を見る
- 2006-10-30
著者
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Yeom G
Sungkyunkwan Univ. Kyounggi Kor
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Yeom Geun
Sungkyunkwan Univ. Suwon Kor
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JEONG Chang
Department of Materials Science & Engineering, Sungkyunkwan University
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LEE June
Department of Materials Science & Engineering, Sungkyunkwan University
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LIM Jong
Department of Materials Science & Engineering, Sungkyunkwan University
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YEOM Geun
Department of Materials Science & Engineering, Sungkyunkwan University
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Lee June
Department Of Advanced Materials Science And Engineering Sungkyunkwan University
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Jeong Chang
Sungkyunkwan Univ. Suwon Kor
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Lim Jong
Sungkyunkwan Univ. Suwon Kor
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ZAVALEYEV Viktor
Department of Materials Science & Engineering, Sungkyunkwan University
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KYUNG Se
Department of Materials Science & Engineering, Sungkyunkwan University
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Lee J
System Ic R&d Division Hynix Semiconductor Inc.
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