Novel Internal Linear Inductively Coupled Plasma Source for Flat Panel Display Applications
スポンサーリンク
概要
- 論文の詳細を見る
In this study, using two different types of linear internal type inductively coupled plasma sources with a serpentine-type antenna and a novel double-comb type antenna having the size of $1020\times 830$ mm2, the characteristics of their plasmas were compared as the application to the flat panel display manufacturing. The use of the double-comb type antenna instead of the serpentine-type antenna showed two times higher plasma and radical densities, and more stable plasma when rf power higher than 2000 W was applied. By the application of 5000 W of rf power with 15 mTorr Ar, a high plasma density of $2.2\times 10^{11}$/cm3 with the plasma uniformity of 8% could be obtained for the double-comb type antenna. The increase of plasma density, radical density, and plasma stability for the double-comb type antenna compared to the serpentine-type antenna appears from the higher inductive coupling and less standing wave effect compared to the serpentine-type antenna.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-11-15
著者
-
Yeom Geun
Department Of Advanced Materials Science And Engineering Sungkyunkwan University
-
Jung Seung
Department Of Dermatology College Of Medicine Sungkyunkwan University
-
Kim Kyong
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon, Gyunggi-do 440-746, Korea
-
Yeom Geun
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic Korea
-
Kim Kyong
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic Korea
関連論文
- Characteristics of Organic Light-Emitting Devices by the Surface Treatment of Indium Tin Oxide Surfaces Using Atmospheric Pressure Plasmas
- Effect of N_2O to C_4F_8/O_2 on Global Warming during Silicon Nitride Plasma Enhanced Chemical Vapor Deposition (PECVD) Chamber Cleaning Using a Remote Inductively Coupled Plasma Source : Nuclear Science, Plasmas, and Electric Discharges
- C_4F_8O/O_2/N-based Additive Gases for Silicon Nitride Plasma Enhanced Chemical Vapor Deposition Chamber Cleaning with Low Global Warming Potentials
- High Efficiency White Organic Light-Emitting Diodes from One Emissive Layer
- Effect of Indium-Oxide Deposited Using an Oxygen Ion-Beam-Assisted-Deposition to Top-Emitting Organic Light-Emitting Diodes
- Effects of Tin Concentration on the Electrical Properties of Room-Temperature Ion-Beam-Assisted-Evaporation-Deposited Indium Oxide Thin Films : Surfaces, Interfaces, and Files
- Usefulness of liquid-based preparation in urine cytology
- A Case of Pretibial Mucinosis without Thyroid Disease
- Maximizing Total QoS-Provisioning of Image Streams with Limited Energy Budget
- Energy-Aware Error Correction for QoS-Provisioning Real-Time Communications in Wireless Networks
- A Study of Sapphire Etching Characteristics Using BCl_3-based Inductively Coupled Plasmas
- Serum concentration of the soluble interleukin-2 receptor in vitiligo patients
- Implementation of computational methods to pattern recognition of movement behavior of Blattella germanica (Blattaria : Blattellidae) treated with Ca^ signal inducing chemicals
- Effect of an Atmospheric Pressure Plasma Cleaning on the Outgassing Characteristics of MgO Layer for Plasma Display Panel
- Etching of Copper Films for Thin Film Transistor Liquid Crystal Display using Inductively Coupled Chlorine-Based Plasmas
- Biomedical Applications of Low Temperature Atmospheric Pressure Plasmas to Cancerous Cell Treatment and Tooth Bleaching
- The effect of ketamine on tracheal intubating conditions without neuromuscular blockade during sevoflurane induction in children
- SLA-Based Scheduling of Bag-of-Tasks Applications on Power-Aware Cluster Systems
- Plasma Characteristics of Large Area Inductively Coupled Plasma System Using Ferrite-Module-Enhanced U-Type Antenna
- Prolapsing Mucosal Polyps in the Sigmoid Colon: Presenting with Chronic Abdominal Cramping Pain and Colonic Obstruction
- Characteristics of Silicon Carbide Etching Using Magnetized Inductively Coupled Plasma
- Effect of Antenna Diameter on the Characteristics of Internal-Type Linear Inductively Coupled Plasma
- Characteristics of Parallel Internal-Type Inductively Coupled Plasmas for Large Area Flat Panel Display Processing
- A precisely gain controlled RF front end for T-DMB tuner ICs
- Characteristics of a Multilayer SiOx(CH)yNz Film Deposited by Low Temperature Plasma Enhanced Chemical Vapor Deposition Using Hexamethyldisilazane/Ar/N2O
- Deposition of SiO2 by Plasma Enhanced Chemical Vapor Deposition as the Diffusion Barrier to Polymer Substrates
- Study on the O2 Plasma Treatment of Indium Tin Oxide for Organic Light Emitting Diodes Using Inductively Coupled Plasma
- Characteristics of Plasma Using a Ferromagnetic Enhanced Inductively Coupled Plasma Source
- Characteristics of Inductively Coupled Plasma using Internal Double Comb-type Antenna for Flat Panel Display Processing
- Novel Internal Linear Inductively Coupled Plasma Source for Flat Panel Display Applications
- Characteristics of Large Area Inductively Coupled Plasma Using a Multiple Linear Antennas with U-Type Parallel Connection for Flat Panel Display Processing
- Plasma Characteristics of Inductively Coupled Plasma Using Dual-Frequency Antennas
- Selective Etching of Magnetic Tunnel Junction Materials Using CO/NH
- Effect of an Atmospheric Pressure Plasma Cleaning on the Outgassing Characteristics of MgO Layer for Plasma Display Panel
- Selective Etching of Magnetic Tunnel Junction Materials Using CO/NH₃ Gas Mixture in Radio Frequency Pulse-Biased Inductively Coupled Plasmas (Special Issue : Dry Process)
- An Optimal Resource Sharing in Hierarchical Virtual Organizations in the Grid
- Impact of diabetes mellitus on recurrence and progression in patients with non-muscle invasive bladder carcinoma : A retrospective cohort study