Selective Etching of Magnetic Tunnel Junction Materials Using CO/NH₃ Gas Mixture in Radio Frequency Pulse-Biased Inductively Coupled Plasmas (Special Issue : Dry Process)
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Yang Kyung
Department Of Biotechnology The Catholic University Of Korea
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Kim Hoe
Department of Information Display, Hongik University, Seoul 121-791, Korea
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Jeon Min
SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic of Korea
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Yeom Geun
SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic of Korea
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Kang Se
SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic of Korea
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Kim Kyong
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic Korea
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Kim Hoe
Department of Materials Science and Engineering, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic Korea
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