Characteristics of Large Area Inductively Coupled Plasma Using a Multiple Linear Antennas with U-Type Parallel Connection for Flat Panel Display Processing

概要

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In this study, the characteristics of large area internal linear inductively coupled plasma (ICP) sources of $1{,}020\times 920$ mm2 (substrate area is $880\times 660$ mm2) were investigated using a multiple linear antennas with U-type parallel connection. Using the multiple linear antennas with U-type parallel connection, a high plasma density of $2\times 10^{11}$ cm-3 and a high power transfer efficiency of about 88% could be obtained at 5 kW of RF power and with 20 mTorr Ar. A low plasma potential of less than 26 V and a low electron temperature of 2.6–3.2 eV could be also obtained. The measured plasma uniformity on the substrate size of fourth generation ($880\times 660$ mm2) was about 4%, therefore, it is believed that the multiple linear antennas with U-type parallel connection can be successfully applicable to the large area flat panel display processing.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2006-11-15