Plasma Characteristics of 450 mm Diameter Ferrite-Enhanced Inductively Coupled Plasma Source
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概要
- 論文の詳細を見る
The effect of C-shaped ferrite modules installed above a spiral-type inductively coupled plasma (ICP) antenna coil and the plasma characteristics of an ICP source operated at 2 MHz were investigated in order to realize 450 mm wafer processing. The application of an appropriate amount of Ni–Zn ferrite modules to the antenna increased the plasma density slightly and decreased the plasma potential, while the application of the ferrite modules all over the antenna line decreased the plasma density and increased the plasma potential. In particular, by installing the ferrite modules locally in a low-plasma-density region, plasma uniformity was improved effectively.
- 2010-08-25
著者
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Hong Seung
Department Of Biological Sciences Dankook University
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Lim Jong
Department Of Advanced Materials Science And Engineering Sungkyunkwan University
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Yeom Geun
Sungkyunkwan Advanced Institute of Nano Technology (NCRC), Suwon, Kyunggi-do 440-746, Korea
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Gweon Gwang
Department of Materials Science and Engineering, Sungkyunkwan University, Suwon, Kyunggi-do 440-746, Korea
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Lim Jong
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon, Gyunggi-do 440-746, Korea
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