Deposition of Mechanically Hard Amorphous Carbon Nitride Films with High $[\text{N}]/([\text{N}]+[\text{C}])$ Ratio

概要

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Mechanically hard amorphous carbon nitride films were prepared by a combination of radio frequency (RF) bias voltage applied to a substrate and chemical vapor deposition using a decomposition reaction of BrCN with a microwave discharge flow of Ar. A pulsed operation of the negative RF bias voltage ($-V_{\text{RF}}$) was applied to avoid excess sputtering of the film. The $[\text{N}]/([\text{N}]+[\text{C}])$ ratios of the films were ${\approx}0.5$ irrespective of the application of $-V_{\text{RF}}$. The maximum hardness was $36\pm 10$ GPa for the film obtained under the conditions of $-V_{\text{RF}}=100$ V, a pulse period of 1000 s, and a pulse-on time of 800 s. According to the IR spectra, the intensity of the stretching vibration of the C–N bond was increased by the application of $-V_{\text{RF}}$. The Raman spectra showed increases in the relative intensity and width of the D-band. From these observations, the mechanism of film hardening when $-V_{\text{RF}}$ is applied was discussed.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2006-10-30