Photoexcitation Process Leading to Modification on Poly(tetrafluoroethylene) Surface by Irradiation of Synchrotron Radiation in Soft X-ray Region
スポンサーリンク
概要
- 論文の詳細を見る
Photoexcitation process leading to a variation in the wettability of a poly(tetrafluoroethylene) (PTFE) surface induced by synchrotron radiation (SR) exposure in the soft X-ray region was investigated. It was found that two types of photoexcitation, that is, the formations of a hydrophobic surface and a hydrophilic surface, proceed on the PTFE surface with the exposure to SR. The formation rate of the hydrophobic surface strongly depended on substrate temperature.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-05-15
著者
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Kanda Kazuhiro
University Of Hyogo Laboratory Of Advanced Science And Technology For Industry
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IDETA Tomoya
University of Hyogo, Faculty of Engineering
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Ishigaki Hiroyuki
University Of Hyogo Faculty Of Engineering
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Kato Yuri
University Of Hyogo Laboratory Of Advanced Science And Technology For Industry
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Matsui Shinji
University Of Hyogo
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Haruyama Yuichi
University of Hyogo, Laboratory of Advanced Science and Technology for Industry, Kamigori, Hyogo 678-1205, Japan
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Haruyama Yuichi
University of Hyogo, Graduate School of Science, Laboratory of Advanced Science and Technology for Industry (LASTI), 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Ishigaki Hiroyuki
University of Hyogo, Faculty of Engineering, Himeji, Hyogo 671-2201, Japan
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Ideta Tomoya
University of Hyogo, Faculty of Engineering, Himeji, Hyogo 671-2201, Japan
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Kato Yuri
University of Hyogo, Laboratory of Advanced Science and Technology for Industry, Kamigori, Hyogo 678-1205, Japan
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Kanda Kazuhiro
University of Hyogo, Laboratory of Advanced Science and Technology for Industry, Kamigori, Hyogo 678-1205, Japan
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