Nanoimprint and Lift-Off Process Using Poly(vinyl alcohol)
スポンサーリンク
概要
- 論文の詳細を見る
We developed a lift-off process for a nanoimprint lithography (NIL) using poly(vinyl alcohol) (PVA) as the replicated material. PVA could easily be dissolved in water. A conventional lift-off process using poly(metyl methacrylate) (PMMA) uses acetone as a solvent, while the lift-off process using PVA uses water as a solvent, which is an ecologically friendly process. We demonstrated Au patterns with sub-μm dimensions using a lift-off process with a PVA single layer. In addition, an Hydrogen silsesquioxane (HSQ)/PVA bilayer structure was used for the lift-off process. This bilayer structure could be fabricated by room-temperature NIL and dry etching. Au patterns were easily obtained using the bilayer structure having an inverse tapered shape. In the lift-off process without using HSQ/PVA bilayer, Au wiring with sub-μm linewidth could be obtained, however, 100-nm-linewidth patterns did not remained. Line-and-spacing gratings of 100 nm in the Au patterns were demonstrated using the water lift-off process with the HSQ/PVA bilayer structure.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-11-15
著者
-
Matsui Shinji
University Of Hyogo
-
Tone Katsuhiko
Meisyo Co., 148 Numa, Hikami-cho, Hikami-gun, Hyogo 669-3534, Japan
-
Nakamatsu Ken-ichiro
University of Hyogo, Graduate School of Science, LASTI, 3-1-2, Koto, Kamigori, Ako, Hyogo 678-1205, Japan
-
Nakamatsu Ken-ichiro
University of Hyogo, Graduate School of Science, Laboratory of Advanced Science and Technology for Industry (LASTI), 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
-
Matsui Shinji
University of Hyogo, Graduate School of Science, LASTI, 3-1-2, Koto, Kamigori, Ako, Hyogo 678-1205, Japan
関連論文
- Fabrication of Nanomanipulator with SiO_2/DLC Heterostructure by Focused-Ion-Beam Chemical Vapor Deposition
- Brilliant Blue Observation from a Morpho-Butterfly-Scale Quasi-Structure
- Excitation Energy Dependence for the Li 1s X-ray Photoelectron Spectra of LiMn_2O_4
- Nanostructure Analysis of Nanosprings Fabricated by Focused-Ion-Beam Chemical Vapor Deposition
- Effects of Annealing on Material Characteristics of Diamond-Like Carbon Film Formed by Focused-Ion-Beam Chemical Vapor Deposition
- Elementary Analysis of Diamond-Like Carbon Film Formed by Focused-Ion-Beam Chemical Vapor Deposition
- Nanoimprint Mold Repair by Ga+ Focused-Ion-Beam Direct Etching
- Nanoimprint Lithography : Present and Future(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
- Nanomechanical Switch formed by Focused-Ion-Beam Chemical Vapor Deposition
- Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient
- Effect of Oxygen Plasma Irradiation on Hydrogen Silsesquioxane Nanopatterns Replicated by Room-Temperature Nanoimprinting
- Nanoimprint and Lift-Off Process Using Poly(vinyl alcohol)
- Room-Temperature Nanoimprint Lithography Using Photosensitive Dry Film
- Nanoimprint Lithography : Present and Future(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
- Photoexcitation Process Leading to Modification on Poly(tetrafluoroethylene) Surface by Irradiation of Synchrotron Radiation in Soft X-ray Region
- Study of Demolding Characteristics in Step-and-Repeat Ultraviolet Nanoimprinting
- Mechanical Characteristics of Diamond-Like-Carbon Nanosprings Fabricated by Focused-Ion-Beam Chemical Vapor Deposition