Room-Temperature Nanoimprint Lithography Using Photosensitive Dry Film
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概要
- 論文の詳細を見る
A photosensitive dry film has been proposed for the first time as the replication material for room-temperature nanoimprint lithography (RT-NIL) and UV curing. Lamination was applied to the formation of a photosensitive dry resin, as a substitute method of spin coating. It produces a homogeneous dry resin on the poly(ethylene terephthalate) (PET) used as the base sheet. UV curing is also needed to maintain imprinted patterns. We have successfully fabricated a dry film with line-and-spacing gratings of 150 nm and nanoscale patterns of a 30 nm linewidth by RT-NIL and UV curing. Furthermore, using RT-NIL, we have successfully obtained dry film patterns $60 \times 100$ mm2 in size.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-05-15
著者
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Matsui Shinji
University Of Hyogo
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Tone Katsuhiko
Meisyo Co., 148 Numa, Hikami-cho, Hikami-gun, Hyogo 669-3534, Japan
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Nakamatsu Ken-ichiro
University of Hyogo, Graduate School of Science, LASTI, 3-1-2, Koto, Kamigori, Ako, Hyogo 678-1205, Japan
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Nakamatsu Ken-ichiro
University of Hyogo, Graduate School of Science, Laboratory of Advanced Science and Technology for Industry (LASTI), 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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