Fabrication of Nanogap Electrodes Using Ultrathin Metal Film
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概要
- 論文の詳細を見る
We fabricated a trench structure on an ultrathin, flat Pt film by a scratching technique using an atomic force microscope (AFM) tip. Precise control of the loading force of the tip during the scratching process made it possible to fabricate a fine trench structure without Pt debris on both sides of the trench. Nanogap electrodes were made by this method. Their electrical isolation was confirmed by Kelvin-probe force microscopy (KFM) measurements. Furthermore, we evaporated methylquinquethiophen (M5T) molecules onto the nanogap electrodes and measured the current-to-voltage ($I$-$V$) characteristics of the M5T film. We demonstrated that electrical measurements by KFM, utilizing ultrathin Pt nanogap electrodes, was a very attractive method of investigating the local properties of organic molecular films.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-15
著者
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KOBAYASHI Kei
International Innovation Center, Kyoto University
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Matsushige Kazumi
Department Of Applied Science Faculty Of Engineering Kyushu University
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Hotta Shu
Photonics And Materials Research Department Kashiwa Laboratory Institute Of Research And Innovation
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Horiuchi Toshihisa
Department Of Applied Physics Faculty Of Engineering Kyushu University
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Miyazaki Takashi
Department Of Animal Science Faculty Of Bioresources Mie University
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Yamada Hirofumi
Department of Electrical Science and Engineering, Kyoto University, Katsura, Nishikyo-ku, Kyoto 615-8510, Japan
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Miyazaki Takashi
Department of Electronic Science and Engineering, Kyoto University, Yoshida-Honmachi, Sakyo, Kyoto 606-8501, Japan
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Ishida Kenji
Department of Applied Chemistry, Ibaraki University
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