MNM-P1-2 スパッタリング法によるTi-Ni形状記憶合金ナノスケール薄膜の作製と評価(合同ポスターセッション P1 単結晶・多結晶シリコンの疲労寿命評価とメカニズムの解明)

概要

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Ti-Ni shape memory alloy thin film has excellent characteristic for application to the micro-nano system. The Ti-Ni thin films were prepared on a Si substrate by RF magnetron sputtering from Ti and Ni target. The thickness of Ti-Ni thin films were 150 nm. Ti-Ni shape memory alloy nano-scale thin films were prepared by heat treatment after deposition. The influence on mechanical characteristic and structure by the change in heat treatment temperature were investigated using XRD, nano indenter. micro scratch tester and TEM. As results of evaluation. Ti-Ni nano-scale thin films obtained properties of shape memory alloy by heat treatment above 500℃.
2010-10-12