イオンビーム支援蒸着法を用いたC-N系薄膜形成時のNおよびArイオンの照射効果

概要

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Simultaneous irradiation of Ar ion is often employed to synthesize C-N films by ion-beam-assisted deposition. To clarify individual roles of N ion(reactive) and Ar ion(inert), films were prepared on Si(001) substrates, such as only C deposited (Carbon film), C evaporated in the atmosphere of 4×10^<-2> Pa of N_2 (Carbon/N), C evaporated under the simultaneous irradiation of Ar ion (Carbon/At^+), co-evaporated C and N (C-N), and co-evaporated C and N under the irradiation of Ar ion (C-N/Ar^+). The differences of mechanical properties of the films are consistently explained in terms of chemical bonding manner as well as aligned structure. It is considered that the bombardment of N and Ar ions promotes two-dimensional network of chemical bonds forming the ordered stacking of graphite-like sheets and that the consequent columnar alignment perpendicular to the substrate surface is advantageous from the point of mechanical properties.
公益社団法人精密工学会の論文
2001-11-05