イオンビーム支援蒸着法を用いて形成した窒化炭素薄膜のトライボロジー特性と微細構造との相関 : Arイオンアシスト効果

概要

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Carbon nitride (C-N) thin films have been prepared by ion-beam-assisted deposition. The correlation of the influence of the Ar ion assist in the tribological properties and microstructure of C-N films were investigated. The ion-beam gas ratio (Ar/N_2 ratio) was changed between 0 and 2. The tribological properties were measured by pin-on-disc type tribotester. The microstructure of the C-N thin films was investigated by X ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). The friction coefficients were 0.15-0.20 irrespective of the ion-beam gas ratio and frictional materials. However, the film which formed under condition of Ar/N_2 =1.0 showed excellent wear resistance. It also showed highest hardness of 21 GPa in this experiment. By the XPS analysis and TEM observation, microstructure of C-N thin film changed from amorphous to three dimensional crystalline-like structure by Ar ion adddtion. Consequently, it shows that the addition of Ar ion was very effective for improvement of mechanical properties when C-N thin film was formed by ion-beam-assisted deposition.
2001-07-25