Dry-Etching Characteristics of Attenuated Phase-Shifting Masks using C1_2/CF_4/O_2/He Plasmas

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概要

• 論文の詳細を見る
• 2002-08-15

著者

• LEE Jung-Hee

  School of Electronic and Electrical Engineering, Kyungpook National University

• Jung S‐m

  Pohang Univ. Sci. And Technol. Pohang Kor

• Jung Sung-mo

  Photomask R&d Center

• Jung Sung-mo

  Department Of Materials Science And Engineering Pohang University Of Science And Technology

• Lee Jung-hee

  School Of Electrical Engineering And Computer Science Kyungpook National University

• Cha Han-sun

  Photomask R&d Center

• Choi Se-jong

  Photomask R&d Center

• Jeong Soo

  Photomask R&d Center

• Jung Sung-mo

  Graduate Inst. Of Ferrous Technol. (gift) Pohang Univ. Of Sci. And Technol. (postech)

• YOON Si-Yeul

  Photomask R&D Center

• CHOI Sang-Soo

  Photomask R&D Center

• Yoon Si-yeul

  Photomask R&d Center

• Lee Jung-Hee

  School of Electrical Engineering & Computer Science, Kyungpook National University, Daegu 702-701, Korea

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