CHOI Sang-Soo | Photomask R&D Center
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概要
関連著者
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CHOI Sang-Soo
Photomask R&D Center
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LEE Jung-Hee
School of Electronic and Electrical Engineering, Kyungpook National University
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Jung S‐m
Pohang Univ. Sci. And Technol. Pohang Kor
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Jung Sung-mo
Photomask R&d Center
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Jung Sung-mo
Department Of Materials Science And Engineering Pohang University Of Science And Technology
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Lee Jung-hee
School Of Electrical Engineering And Computer Science Kyungpook National University
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Cha Han-sun
Photomask R&d Center
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Lee Yong
Semiconductor R&d Division Samsung Electronics Co. Ltd.
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Choi Se-jong
Photomask R&d Center
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Jeong Soo
Photomask R&d Center
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Jung Sung-mo
Graduate Inst. Of Ferrous Technol. (gift) Pohang Univ. Of Sci. And Technol. (postech)
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YOON Si-Yeul
Photomask R&D Center
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Yoon Si-yeul
Photomask R&d Center
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Patil Manish
Photomask Research and Development Centre, PKL Ltd., 493-3 Sungsung, Cheonan 330-300, Korea
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Kim Jong-Min
Photomask Research and Development Centre, PKL Ltd., 493-3 Sungsung, Cheonan 330-300, Korea
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Jung Sung-Mo
Semiconductor Thin Film Laboratory, School of Electrical Engineering and Computer Science, Kyungpook National University, 1370 Sankyuk-dong, Buk-gu, Daegu 702-701, Korea
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Lee Yong
Semiconductor Physics Research Center and School of Semiconductor and Chemical Engineering, Chonbuk National University, Chonju 561-756, Republic of Korea
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Lee Yong
Semiconductor Thin Film Laboratory, School of Electrical Engineering and Computer Science, Kyungpook National University, 1370 Sankyuk-dong, Buk-gu, Daegu 702-701, Korea
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Choi Sang-Soo
Photomask Research and Development Centre, PKL Ltd., 493-3 Sungsung, Cheonan 330-300, Korea
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Lee Jung-Hee
School of Electrical Engineering & Computer Science, Kyungpook National University, Daegu 702-701, Korea
著作論文
- Dry-Etching Characteristics of Attenuated Phase-Shifting Masks using C1_2/CF_4/O_2/He Plasmas
- Prevention of Progressive Mask Defects through Residual Ammonium and Sulfuric Ion Control