20702 CMPにおける磁気軸受制御型研磨テーブルの姿勢制御(機械工学が支援する半導体製造技術(I),OS13 機械工学が支援する半導体薄膜製造技術)

概要

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Magnetic bearing technology is installed in a turn-table of CMP. It is possible to control freely the tilt of a turn-table, and vibration by this. It is able to reduce to 5×10^<-5> [rad] by controlling the turn-table, although the vibration of 27×10^<-5> [rad] is shown in the turn-table surface when a turn-table is not controlled. Further, it is possible to lean a turn-table freely by controlling the current to add, or to make it vibrate. For example, it can be tilted 80×10^<-5> [rad], or vibratied of pitch 2[Hz] and amplitude ±40×10^<-5> [rad]. Although polished by making it tilt or vibrate, compared with the case where it does not control, it is changeless at a polish profile or polish rate.
2005-03-17