Liquid-Nitrogen-Cooled Dry Etching of YBaCuO Thin Films
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概要
- 論文の詳細を見る
A new dry etching method has been developed for patterning YBaCuO thin films with less damage, wherein samples are cooled by liquid nitrogen. It is found that the critical current density J_c of films etched by this cooling method is significantly improved, more than one order of magnitude higher than that for the films etched at 5℃. Furthermore, it is found that this technique causes less damage to the surface of the YBaCuO films, compared to the etching at 5℃. This result suggests that the dry etching process with liquid nitrogen cooling is a promising method for the fabrication of high-T_c superconducting electronic devices of small dimensions.
- 社団法人応用物理学会の論文
- 1992-08-01
著者
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AKOH Hiroshi
Electrotechical Laboratory (ETL)
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AOYAGI Masahiro
Electrotechical Laboratory (ETL)
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Takada Susumu
Electrotechnical Laboratory
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Takada S
Saitama Univ. Urawa‐shi Jpn
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Aoyagi Minoru
Electronics Engineering Group Nissan Motor Co. Ltd
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Aoyagi Manabu
Muroran Inst. Of Technol. Hokkaido Jpn
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Akoh H
National Institute Of Advanced Industrial Science And Technology
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SATO Hiroshi
Electrotechnical Laboratory
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NISHIHARA Keirou
Electrotechnical Laboratory
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Sato H
National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Nishihara Keirou
Electrotechnical Laboratory:(present Address) Chiba Institute Of Technology
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