Annealing Effect on Sputtered CoCr Films

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概要

• 論文の詳細を見る

• Changes in structure of sputter-deposited CoCr films are discussed in conjunction with those in magnetic properties by means of annealing. At an annealing temperature of 400℃, drastic changes are observed with respect to crystallinity, saturation magnetization, and perpendicular anisotropy. Then at an annealing temperature of 480℃, the film structure becomes homogeneous. Furthermore, the films made especially at a high substrate temperature of 220℃ are suggested to be composed of at least two regions with different lattice coherency along the film thickness; such a structure contributes to a large value of the perpendicular coercivity and, together with segregation, to the perpendicular anisotropy.

• 社団法人応用物理学会の論文
• 1990-08-20

著者

• UCHIYAMA Yasushi

  Department of Electronic Engineering, Faculty of Engineering, Osaka University

• Ueda T

  Nuclear Engineering Research Laboratory University Of Tokyo

• SATO Hiroshi

  Electrotechnical Laboratory

• UCHIYAMA Yoichi

  R&D Center, Digital Equipment Corporation Japan

• ISHIBASHI Kazuo

  R&D Center, Digital Equipment Corporation Japan

• SATO Hiroshi

  R&D Center, Digital Equipment Corporation Japan

• UEDA Toshifumi

  R&D Center, Digital Equipment Corporation Japan

• HWANG Uee-Myung

  R&D Center, Digital Equipment Corporation Japan

• Sato H

  National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn

• Uchiyama Yasushi

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Hwang Uee-myung

  R&d Center Digital Equipment Corporation Japan

• Ishibashi Kazuo

  R&d Center Digital Equipment Corporation Japan

• Ueda Toshifumi

  R&d Center Digital Equipment Corporation Japan

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