Palladium Thin-Film Resistors for Josephson LSI Circuits
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概要
- 論文の詳細を見る
Palladium thin-film resistors have been systematically investigated for Josephson LSI circuits. It has been found that the sheet resistance of the palladium was strongly affected by the deposition rate. By the introduction of precise control for the deposition rate using an electron-beam gun, the palladium thin-film resistors have been successfully integrated on the chips with a resistance variation of less than ±2% as is required for fablication runs.
- 社団法人応用物理学会の論文
- 1992-08-15
著者
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NAKAGAWA Hiroshi
National Institute of Advanced Industrial Science and Technology
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NAKAGAWA Hiroshi
Electrotechical Laboratory (ETL)
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AOYAGI Masahiro
Electrotechical Laboratory (ETL)
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Takada S
Saitama University Faculty Of Engineering
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Takada Susumu
Electrotechnical Laboratory
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Takada S
Saitama Univ. Urawa‐shi Jpn
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Aoyagi Minoru
Electronics Engineering Group Nissan Motor Co. Ltd
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Nakagawa Hiroshi
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Nakagawa H
Univ. Tokyo Tokyo Jpn
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Kurosawa Itaru
Electrotechnical Laboratory
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