Diffusion and Electrical Properties of Iron-Related Defects in N-Type Silicon Grown by Czochralski- and Floating Zone Method
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-09-15
著者
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TANAKA Shuji
Department of Nanomechanics, Graduate School of Engineering, Tohoku University
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KITAGAWA Hajime
Department of Electronic Materials Engineering, Fukuoka Institute of Technology
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Kitagawa Hajime
Department Of Electronics Faculty Of Engineering Fukuoka Institute Of Technology
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Kitagawa Hajime
Department Of Electrical Engineering Faculty Of Engineering Kyushu University
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Tanaka Shuji
Department Of Information Electronics Faculty Of Engineering Fukuoka Institute Of Technology
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Tanaka Shuji
Department Of Electronics Faculty Of Engineering Fukuoka Institute Of Technology
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Tanaka Shuji
Department of Electronic Materials Engineering, Fukuoka Institute of Technology,
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TANAKA Shuji
Department of Chemistry, Faculty of Science, Kyushu University
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