Positive Ions in RF Discharge Plasmas of C_4F_8/Ar and C_4F_8/O_2 Mixtures

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1998-10-15

著者

• 佐々木 聡

  東京工業大学 応用セラミックス研究所

• Hirose Yoichi

  Department Of Electronics School Of Engineering Tokai University

• ISHIKAWA Itsuo

  Faculty of Engineering, Yamanashi University

• SUGANOMATA Shinji

  Faculty of Engineering, Yamanashi University

• SAITO Yukinori

  Faculty of Engineering Yamanashi University

• Ishikawa I

  Faculty Of Engineering Yamanashi University

• Ishikawa Itsuo

  Faculty Engineering Yamanashi University

• Saito Y

  Faculty Of Engineering Yamanashi University

• Sasaki Shinya

  Faculty Of Engineering Yamanashi University

• Nagaseki Kazuya

  Tokyo Electron Yamanashi Ltd.

• HIROSE Yuji

  Faculty of Engineering, Yamanashi University

• Hirose Yuji

  Faculty Of Engineering Yamanashi University

• Suganomata S

  Yamanashi Univ. Kofu Jpn

• Suganomata Shinji

  Electrical Engineering Yananashi University

• Suganomata Shinji

  Faculty Engineering Yamanashi University

• Hirose Yukio

  Department Of Materials Science And Engineering Kanazawa University

• Hirose Y

  Department Of Materials Science And Engineering Kanazawa University

• Suganomata S

  Faculty Of Engineering Yamanashi University

• Nagaseki Kazuya

  Tokyo Electron Ltd., Nirasaki 407-01, Japan

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