Positive Ions in C 4F 8 RF Discharge in a Planar Diode
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概要
- 論文の詳細を見る
Positive ions were measured in situ by direct sampling from C4F8 discharge at 13.56 MHz using a quadrupole mass spectrometer. Major positive ions in the discharge plasma are CF+, CF2+, CF3+, C2F4+, C2F5+ and C3F5+. When the gas flow rate increases, the signal intensity of C2F4+ increases. The intensity variation of C3F5+ is similar to that of C2F4+. However, those of CF3+ and C2F5+ decrease with increasing gas flow rate, and those of CF+ and CF2+ are almost constant. The difference in intensity variations is considered to result from the production processes of ions.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1997-08-15
著者
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SAITO Yukinori
Faculty of Engineering Yamanashi University
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Ishikawa Itsuo
Faculty Engineering Yamanashi University
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Sasaki Shinya
Faculty Of Engineering Yamanashi University
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Hirose Yuji
Faculty Of Engineering Yamanashi University
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Suganomata Shinji
Faculty Engineering Yamanashi University
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Ishikawa Itsuo
Faculty of Engineering, Yamanashi University, 4–3–11 Takeda, Kofu 400, Japan
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Nagaseki Kazuya
Tokyo Electron Ltd., Nirasaki 407-01, Japan
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Hirose Yuji
Faculty of Engineering, Yamanashi University, 4–3–11 Takeda, Kofu 400, Japan
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Saito Yukinori
Faculty of Engineering, Yamanashi University, 4–3–11 Takeda, Kofu 400, Japan
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