Optical Properties of LiNbO_3 Implanted with Ag^+ Ions
スポンサーリンク
概要
- 論文の詳細を見る
Ag^+ ions were implanted into LiNbO_3 held at room temperatures with the energy of 25 keV in the range of 2×10^<15> to 8×10^<16> ions/cm^2. Absorption in the visible range was measured. LiNbO_3 implanted with Ag^+ ions shows brilliant reddish-violet and a large absorption peak at about 520 nm. Ag atoms aggregate during implantation and form very small flat particles of the size of about 0.3 to a few micrometers in surface layers of depths up to 16 nm.
- 1994-07-01
著者
-
SAITO Yukinori
Faculty of Engineering Yamanashi University
-
Suganomata Shinji
Faculty Engineering Yamanashi University
-
DEYING Shang
Faculty of Engineering, Yamanashi University
-
Deying Shang
Faculty Of Engineering Yamanashi University
関連論文
- Electron Temperature in RF Discharge Plasma of CF_4/N_2 Mixture
- Mass Spectrometry of Discharge Products at 13.56 MHz in SF_6 Gas ( Plasma Processing)
- Spatiotemporal Profiles of Optical Emission Spectra in CF_4 Discharges at 1 MHz ( Plasma Processing)
- Low-Frequency Waves in SF_6 Positive Columns Diluted with N_2 Gas
- Attachment-Enhanced Instability in CF_4 Positive Columns
- Forward Waves Excited by Pulsed Electron Beam Injection into Low-Pressure N_2 Gas
- Discharge and Oscillation due to Axial Injection of an Impulsive Electron Beam into SF_6 Gas
- Positive Ions in RF Discharge Plasmas of C_4F_8/Ar and C_4F_8/O_2 Mixtures
- Positive Ions in C_4F_8 RF Discharge in a Planar Diode
- Characteristics of Parallel-Plate RF Discharges in C_4F_8 Gas and C_4F_8/O_2 Mixtures
- Ionic Species in 13.56 MHz Discharges in CF_4 Gas and Mixtures of It with Ar and O_2
- Positive and Negative Ions in RF Plasmas of SF_6/N_2 and SF_6/Ar Mixtures in a Planar Diode
- Positive Ions in RF Discharge Plasma of CF_4 Gas in a Planar Diode
- Negative Ions in 13.56 MHz Discharge of SF_6 Gas in a Planar Diode
- Mass Spectrometrie Observation of Decomposition Products SF_x (x=1,2) in SF_6 Discharge at 13.56 MHz
- Characteristics of 1MHz Discharge in SF_6/O_2 Mixture in a Parallel-Plate System
- Characteristics of 1-MHz Discharges in SF_6/Ar and CF_4/Ar Mixtures in a Parallel-Plate System
- Mode Change of 1 MHz Discharge in O_2 Gas at Low Pressure
- Detection Technique of Negative Ions by Photodetachment in SF_6 Low-Frequency Discharge
- Spatiotemporal Variation of Light Emission from SF_6 Parallel-Plate Discharge at Frequencies of 100 and 500 kHz
- Anomalous Photoemission under the Influence of a Charged Substrance in Low-Frequency Parallel-Plates Discharge in N_2 Gas
- Asymmetrical Emission Profiles from Low-Frequency Discharges in SF_6 and in N_2 Gases in a Planar Diode with a Si-Wafer
- Focal Lengths of High-T_c Sintered Superconducting Lenses (Supertrons) for Intense Electron Beams
- Self-Magnetic Fields of Electron Beams Confined to Bores of High-T_c Sintered Superconducting Pipes
- Cascaded High-T_c Bulk Superconductor Lenses (Supertrons) for Intense Electron Beams
- Coloration of Sapphire by Metal-Ion Implantation
- Coloration of Quartz by Metal-Jon Implantation
- Effect of Coating on the Blue-Green Color Imparted to LiNbO_3 by Cu Ion Implantation
- X-Ray Photoelectron Spectroscopy Study of Cu Implanted in LiNbO_3
- Preparation of Y-Ba-Cu-O Films by dc Sputtering
- Coloration of LiNbO_3 by Metal Ion Implantation
- Optical Properties of LiNbO_3 Implanted with Ag^+ Ions
- Photoemission Profiles in Parallel-Plate RF Discharge in SF_6 Gas
- Ionic Species in 13.56 MHz Discharges in CF 4 Gas and Mixtures of It with Ar and O 2
- Characteristics of Parallel-Plate RF Discharges in C 4F 8 Gas and C 4F 8/O 2 Mixtures
- Focal Lengths of High-T c Sintered Superconducting Lenses (Supertrons) for Intense Electron Beams
- Positive Ions in C 4F 8 RF Discharge in a Planar Diode