Rapid Growth of Diamond Films by Arc Discharge Plasma CVD : Condensed Matter
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概要
- 論文の詳細を見る
Diamond films have been synthsized by arc discharge plasma CVD in a hydrogen-argon-ethanol mixture gas. The arc discharge power is about 560 W and the typical gas flow rate is 500-2000cm^3 / min, respectively. The growth rate of diamond films has been obtained about 200-250 μm / h which is higher than that of other CVD methods. The obtained diamond films are identified as natural cubic diamond by X-ray diffraction. It is found that graphitic and amorphous carbon are not contained in the diamond films by Raman spectra. Atomic hydrogen (H) plays important roles in the growth of high-quality diamonds.
- 社団法人応用物理学会の論文
- 1988-09-20
著者
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Hirose Yoichi
Department Of Electronics School Of Engineering Tokai University
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Komaki Kunio
Showa Denko K.k. Central Research Laboratory
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Hirose Yoichi
Department Of Electrical Engineering And Electronics Nippon Institute Of Technology
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AKATSUKA Fumio
Department of Electrical Engineering and Electronics, Nippon Institute of Technology
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Akatsuka Fumio
Department Of Electrical Engineering And Electronics Nippon Institute Of Technology
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