Synthesis of Diamond Thin Films by Thermal CVD Using Organic Compounds
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概要
- 論文の詳細を見る
Diamond thin films have been formed by thermal chemical vapor deposition (thermal CVD) using the organic compounds such as CH_3OH, C_2H_5OH, CH_3COCH_3 C_2H_5COCH_3, and (CH_3)_3N. The films are grown on the silicon substrates with high growth rate (8-10 μm/h) under the pressure ranging 1-800 Torr. This growth rate is ten or several ten times faster than the CVD method using hydrocarbons such as CH_4 and C_2H_2. The films have good crystallinity and high quality in the sense of electron diffraction and Raman spectrum. The Vicker's hardness of the film is about 10000 kg/mm^2 and the gravity of that is about 3.52 g/cm^3.
- 社団法人応用物理学会の論文
- 1986-06-20
著者
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Hirose Yoichi
Department Of Electrical Engineering Nippon Institute Of Technology
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Hirose Yoichi
Department Of Electrical Engineering And Electronics Nippon Institute Of Technology
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TERASAWA Yuki
Department of Electrical Engineering, Nippon Institute of Technology
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