多重磁極マグネトロンスパッタリング法で作製したFe-N薄膜の磁化特性と膜構造

概要

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Thin films of Fe and Fe-N have been prepared using an rf magnetron sputtering system equiped with multipolar magnetic plasma confinement (MMPC), which is efficient for preparation of ferromagnetic thin films at low pressures. For sputtering with 150 W rf-power, the deposition rate of Fe film is 12 - 14 nm/min, which is three times larger than that of conventional planar magnetron sputtering system. Iron nitride films have been sputter-deposited in an Ar-N_2 gas mixture at several pressures, P_<sp>, of 5 - 0.6 mTorr and the gas flow ratio, f_<N2> = N_2/(Ar + N_2), of 0 - 0.6. The crystalline and morphological structures, the nitrogen content in the film, and the resistivity depend strongly on P_<sp> and f_<N2>. These dependences are explained by the energy of sputtered particles reached at the film surface. In particular, the films prepared at 0.6 mTorr, which is realized by MMPC method, exhibit the crystalline structures of Fe, Fe_4N and Fe_3N phases depending on f_<N2>, and show the very high purity.
社団法人日本磁気学会の論文
2004-09-01