超高真空用大電流イオンビーム表面改質装置の開発

概要

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In this paper, a high current ion modification system suitable for vacuum higher than 10^<-7> Pa has been developed. For maintaining such a high vacuum, a liquid metal ion source (LMIS), which hardly emits any gas molecules, has been employed. Then, a lens system, capable of focusing an ion beam of emission angle 60° extracted from the LMIS to a beam having a radius 2 mm at 1 m from the LMIS, has been designed by a numerical computer simulation method. In addition, a mass separator and a decelerating lens has been also designed and installed in the ion modification system. As a result, this system can produce a high purity metal ion beam with an energy in the range 10 eV-10 keV and ion current up to 20μA in a vacuum as high as 10^<-7> Pa, which sufficiently satisfies requirements of modification of substrates.
公益社団法人精密工学会の論文
1991-04-05