光散乱法によるナノメータオーダの粒径測定法の開発(第3報) : 標準微粒子による粒径測定法の評価

概要

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No system has yet been developed to detect the nanometer (nm) order particles. This paper deals with the development of a new method for measuring particle sizes of nm order on the raw silicon (Si) wafers by using a light-scattering method with Ar^+ laser. In this study, the sample models to be measured were made by adhering the standard particles, of which the particle diameter is known, on the surfaces of Si wafers. Using the developed measuring system for the sample, the measurement of particle diameter was attempted to evaluate this measuring method. It was confirmed that this measuring method had an ability to detect the diameter of standard fine particles with relatively high accuracy. According to this, it was able to be verified that this measuring method could nondestructively measure the particle diameter in nm order.
1993-07-05