Inductively Coupled Plasma Mesa Etched InGaN/GaN Light Emitting Diodes Using Cl_2/BCl_3/Ar Plasma
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-09-15
著者
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Hsu Wei-chou
Institute Of Microelectronics Department Of Electrical Engineering National Cheng Kung University
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Hsu Wei-chou
Institute Of Microelectronics Department Of Electrical Engineering National Cheng-kung University
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CHEN Yeong-Jia
Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University
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Chen Yeong-jia
Institute Of Microelectronics Department Of Electrical Engineering National Cheng Kung University
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WANG Tzong-Bin
Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University
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CHE Yen-Wei
Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University
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Chen Yeong-jia
Institute Of Microelectronics Department Of Electrical Engineering National Cheng-kung University
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Che Yen-wei
Institute Of Microelectronics Department Of Electrical Engineering National Cheng-kung University
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Wang Tzong-bin
Institute Of Microelectronics Department Of Electrical Engineering National Cheng-kung University
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Hsu Wei-chou
Institute Of Microelectronics Department Of Electrical Engineering And Advanced Optoelectronic Techn
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