Evaluation of Hafnium-Titanium-Oxide Thin Films Prepared by Reactive Sputtering
スポンサーリンク
概要
著者
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MIURA Noboru
Department of Electronics and Bioinformatics, Science and Technology, Meiji University
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NAKANO Ryotaro
Department of Electronics and Bioinformatics, Science and Technology, Meiji University
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MATSUMOTO Hironaga
Department of Electronics and Bioinformatics, Science and Technology, Meiji University
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Miura N
Department Of Materials Science And Technology Graduate School Of Engineering Sciences Kyushu Univer
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Nakano R
Department Of Electronics And Bioinformatics Science And Technology Meiji University
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Nakano Ryotaro
Department Of Elecronics & Communications School Of Science & Technology Meiji University
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Miura Noriyuki
Oki Electric Industry Co. Ltd.
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Miura N
Department Of Electronics And Bioinformatics Science And Technology Meiji University
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Nakano Ritsuko
Process Development Division Fujitsu Limited
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Miura Naruhisa
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Matsumoto Hironaga
Department Of Electronics And Bioinformatics Science And Technology Meiji University
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Matsumoto Hironaga
Department Of Elecronics & Communications School Of Science & Technology Meiji University
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ANDO Kimio
Department of Electronics and Communications School of Sceince and Technology, Meiji University
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Matsumoto H
Department Of Electronics And Bioinformatics Science And Technology Meiji University
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Miura Noboru
Department Of Elecronics & Communications School Of Science & Technology Meiji University
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Ando Kimio
Department Of Electronics And Communications School Of Sceince And Technology Meiji University
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Matsumoto Hidetoshi
Department Of Electronics And Bioinformatics Science And Technology Meiji University
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