Electrochromism and Electronic Structures of Nitrogen Doped Tungsten Oxide Thin Films Prepared by RF Reactive Sputtering
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概要
- 論文の詳細を見る
The doping effect of nitrogen on amorphous tungsten trioxide (a-WO3) thin films was investigated with regard to electrochromism and electronic structures. The N-doped thin films exhibit a change in electrochromic coloration from transparent yellow to black, whereas the un-doped thin films exhibit blue coloration. In addition, a new absorption peak related to nitrogen doping is observed at 2.3 eV in photoabsorption spectra during the electrochemical coloration/bleaching process. To explain these experimental results, the electronic structures of N-doped tungsten oxide were calculated by the DV-X$\alpha$ molecular orbital method.
- 2008-09-25
著者
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Nakano Ryotaro
Department Of Elecronics & Communications School Of Science & Technology Meiji University
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Matsumoto Setsuko
Department Of Physics Faculty Of Engineering Meiji University
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Matsumoto Hironaga
Department Of Elecronics & Communications School Of Science & Technology Meiji University
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Miura Noboru
Department Of Elecronics & Communications School Of Science & Technology Meiji University
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Nakagawa Koichi
Department Of Chemical Engineering Faculty Of Engineering
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Nakano Ryotaro
Department of Electronics and Bioinformatics, Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan
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Matsumoto Setsuko
Department of Physics, Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan
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Miura Noboru
Department of Electronics and Bioinformatics, Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan
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