Single-Electron Tunneling through Amorphous Carbon Dots Array
スポンサーリンク
概要
- 論文の詳細を見る
Minute amorphous carbon dots were fabricated by electron-beam-induced deposition (EBID) carried out in a scanning electron microscope (SEM) system. The use of residual hydrocarbon molecules as a precursor enabled easy nanostructure fabrication. By optimizing electron-beam conditions, dots with a diameter of as small as 40 nm were successfully obtained. They were arranged in series between fine metal electrodes to form a device with multiple-tunnel junctions. Single-electron charging effects, such as the Coulomb blockade and the Coulomb staircase, were clearly observed at 9.4K.
- 社団法人応用物理学会の論文
- 1997-12-01
著者
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YAMADA Akira
Departments of Immunology, Kurume University School of Medicine
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山田 晃
東京農工大学生物システム応用科学府
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KONAGAI Makoto
Department of Physical Electronics, Tokyo Institute of Technology
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Yamada Akira
Department Of Cardiology Aso-iizuka Hospital
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Miura N
Department Of Materials Science And Technology Graduate School Of Engineering Sciences Kyushu Univer
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SHIRAKASHI Jun-ichi
Electrical and Electronic System Engineering, Tokyo University of Agriculture and Technology
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Konagai Makoto
Department Of Electrical And Electronic Engineering. Tokyo Institute Of Technology
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Miura Naruhisa
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Konagai M
Department Of Physical Electronics Tokyo Institute Of Technology
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Miura N
Advanced Technology R&d Center Mitsubishi Electric Corporation
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MIURA Naruhisa
Department of Electrical and Electronic Engineering, Tokyo Institute of Teclnohogy
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Shirakashi Junichi
Electrotechnical Laboratory
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NUMAGUCHI Tetsuyuki
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
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Konagai Makoto
Department Of Electrical & Electronic Engineering Tokyo Institute Of Technology
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Shirakashi Jun-ichi
Electrotechnical Laboratory
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Numaguchi Tetsuyuki
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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